Twinning-assisted void initiation and crack evolution in Cu thin film: An in situ TEM and molecular dynamics study

Zongde Kou, Yanqing Yang, Lixia Yang, Bin Huang, Xian Luo

Research output: Contribution to journalArticlepeer-review

15 Scopus citations

Abstract

A twinning-induced void initiation mechanism at grain boundary is revealed in Cu through in situ tensile tests. Two microcracks connected by a twin boundary (TB) are formed following the growth of the void, which then develop via the relative sliding of the two crystals beside the migrating TB. The experimental observations of TB migration and dislocation activities are corroborated by performing molecular dynamics simulations.

Original languageEnglish
Pages (from-to)336-340
Number of pages5
JournalMaterials Science and Engineering: A
Volume737
DOIs
StatePublished - 8 Nov 2018

Keywords

  • Cracking
  • Cu
  • In situ TEM
  • Molecular dynamics simulations
  • Twinning

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