TY - JOUR
T1 - The structure and tribological properties of gradient layers prepared by plasma-based ion implantation on 2024 Al alloy
AU - Liao, J. X.
AU - Xia, L. F.
AU - Sun, M. R.
AU - Liu, W. M.
AU - Xu, T.
AU - Xue, Q. J.
PY - 2004/2/7
Y1 - 2004/2/7
N2 - Using plasma-based ion implantation, two types of gradient layers have been prepared on 2024 Al alloy. One is prepared by N-implantation then C-deposition, the other adds an interlayer composed of a Ti layer and a Ti-N layer between N-implantation and C-deposition. C-deposition is carried out at various implanting voltages or C2H2/H2 ratios. The composition depth profiles of these layers were characterized by x-ray photoelectron spectroscopy. The structure, morphologies and microstructure of the C layers were studied using Raman spectroscopy, atomic force microscope and transmission electron microscope, respectively. The surface hardness was measured with a Knoop tester and a mechanical property microprobe. The dry ball-on-disc wear tests were performed in ambient air. The gradient layer without interlayer is composed of an N-implanted layer rich in AlN and a diamond-like carbon (DLC) layer (film), and the two layers are connected with a C-Al transition layer containing Al4C3. The Ti layer rich in α-Ti and the N-implanted layer are connected by a Ti-Al transition layer containing TiAl3, while the Ti-N layer rich in TiN and the DLC film are connected by a C-Ti transition layer containing TiC, TiCN, etc. Thus, the gradient layer with interlayers has optimized the gradient structure. DLC films are compact and amorphous, contain high sp3/sp2 ratios and depend on the implanting voltage and the C2H 2/H2 ratio. Similarly, these gradient layers exhibit significant improvement in morphologies, surface hardness and tribological properties; the interlayer, the implanting voltage and the C2H 2/H2 ratio all have prominent effects on these properties.
AB - Using plasma-based ion implantation, two types of gradient layers have been prepared on 2024 Al alloy. One is prepared by N-implantation then C-deposition, the other adds an interlayer composed of a Ti layer and a Ti-N layer between N-implantation and C-deposition. C-deposition is carried out at various implanting voltages or C2H2/H2 ratios. The composition depth profiles of these layers were characterized by x-ray photoelectron spectroscopy. The structure, morphologies and microstructure of the C layers were studied using Raman spectroscopy, atomic force microscope and transmission electron microscope, respectively. The surface hardness was measured with a Knoop tester and a mechanical property microprobe. The dry ball-on-disc wear tests were performed in ambient air. The gradient layer without interlayer is composed of an N-implanted layer rich in AlN and a diamond-like carbon (DLC) layer (film), and the two layers are connected with a C-Al transition layer containing Al4C3. The Ti layer rich in α-Ti and the N-implanted layer are connected by a Ti-Al transition layer containing TiAl3, while the Ti-N layer rich in TiN and the DLC film are connected by a C-Ti transition layer containing TiC, TiCN, etc. Thus, the gradient layer with interlayers has optimized the gradient structure. DLC films are compact and amorphous, contain high sp3/sp2 ratios and depend on the implanting voltage and the C2H 2/H2 ratio. Similarly, these gradient layers exhibit significant improvement in morphologies, surface hardness and tribological properties; the interlayer, the implanting voltage and the C2H 2/H2 ratio all have prominent effects on these properties.
UR - http://www.scopus.com/inward/record.url?scp=1042292849&partnerID=8YFLogxK
U2 - 10.1088/0022-3727/37/3/014
DO - 10.1088/0022-3727/37/3/014
M3 - 文章
AN - SCOPUS:1042292849
SN - 0022-3727
VL - 37
SP - 392
EP - 399
JO - Journal of Physics D: Applied Physics
JF - Journal of Physics D: Applied Physics
IS - 3
ER -