Study on chemical polishing of CdZnTe wafer surface

Xiao Qin Wang; Wan Qi Jie; Ge Yang

Study on chemical polishing of CdZnTe wafer surface

Xiao Qin Wang, Wan Qi Jie, Ge Yang

School of Materials Sience and Engineering

Northwestern Polytechnical University Xian

Research output: Contribution to journal › Article › peer-review

3 Scopus citations

Abstract

Different concentrations of Br₂-MeOH were used for the chemical polishing of CdZnTe(CZT) surface. It was found that the CZT wafer in 2% Br₂-MeOH had a stationary erosion rate and could be easily controlled. The surface scratches were removed and a shiny surface was obtained. Through AFM analysis, it was proved that the chemical polishing could reduce the surface roughness about 30%. XPS analysis found that the (111) Cd polar face became the nonpolar Te rich surface after the chemical polishing. PL analysis showed that the chemical polishing could reduce the surface trap state density and improve the perfection of surface lattice.

Original language	English
Pages (from-to)	790-793+804
Journal	Rengong Jingti Xuebao/Journal of Synthetic Crystals
Volume	34
Issue number	5
State	Published - Oct 2005

Keywords

CdZnTe
Chemical polishing
Defect
Erosion rate
Mean roughness
Surface composition

Cite this

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title = "Study on chemical polishing of CdZnTe wafer surface",

abstract = "Different concentrations of Br2-MeOH were used for the chemical polishing of CdZnTe(CZT) surface. It was found that the CZT wafer in 2% Br2-MeOH had a stationary erosion rate and could be easily controlled. The surface scratches were removed and a shiny surface was obtained. Through AFM analysis, it was proved that the chemical polishing could reduce the surface roughness about 30%. XPS analysis found that the (111) Cd polar face became the nonpolar Te rich surface after the chemical polishing. PL analysis showed that the chemical polishing could reduce the surface trap state density and improve the perfection of surface lattice.",

keywords = "CdZnTe, Chemical polishing, Defect, Erosion rate, Mean roughness, Surface composition",

author = "Wang, {Xiao Qin} and Jie, {Wan Qi} and Ge Yang",

year = "2005",

month = oct,

language = "英语",

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pages = "790--793+804",

journal = "Rengong Jingti Xuebao/Journal of Synthetic Crystals",

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T1 - Study on chemical polishing of CdZnTe wafer surface

AU - Wang, Xiao Qin

AU - Jie, Wan Qi

AU - Yang, Ge

PY - 2005/10

Y1 - 2005/10

N2 - Different concentrations of Br2-MeOH were used for the chemical polishing of CdZnTe(CZT) surface. It was found that the CZT wafer in 2% Br2-MeOH had a stationary erosion rate and could be easily controlled. The surface scratches were removed and a shiny surface was obtained. Through AFM analysis, it was proved that the chemical polishing could reduce the surface roughness about 30%. XPS analysis found that the (111) Cd polar face became the nonpolar Te rich surface after the chemical polishing. PL analysis showed that the chemical polishing could reduce the surface trap state density and improve the perfection of surface lattice.

AB - Different concentrations of Br2-MeOH were used for the chemical polishing of CdZnTe(CZT) surface. It was found that the CZT wafer in 2% Br2-MeOH had a stationary erosion rate and could be easily controlled. The surface scratches were removed and a shiny surface was obtained. Through AFM analysis, it was proved that the chemical polishing could reduce the surface roughness about 30%. XPS analysis found that the (111) Cd polar face became the nonpolar Te rich surface after the chemical polishing. PL analysis showed that the chemical polishing could reduce the surface trap state density and improve the perfection of surface lattice.

KW - CdZnTe

KW - Chemical polishing

KW - Defect

KW - Erosion rate

KW - Mean roughness

KW - Surface composition

UR - http://www.scopus.com/inward/record.url?scp=28244456432&partnerID=8YFLogxK

M3 - 文章

AN - SCOPUS:28244456432

SN - 1000-985X

VL - 34

SP - 790-793+804

JO - Rengong Jingti Xuebao/Journal of Synthetic Crystals

JF - Rengong Jingti Xuebao/Journal of Synthetic Crystals

IS - 5

ER -

Study on chemical polishing of CdZnTe wafer surface

Abstract

Keywords

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