Structural characteristics of 2024 aluminum alloy plasma-based ion implanted with nitrogen then titanium

J. X. Liao; L. F. Xia; M. R. Sun; W. M. Liu; T. Xu; C. R. Yang; H. W. Chen; C. L. Fu; W. J. Leng

doi:10.1016/j.apsusc.2004.06.145

Structural characteristics of 2024 aluminum alloy plasma-based ion implanted with nitrogen then titanium

J. X. Liao, L. F. Xia, M. R. Sun, W. M. Liu, T. Xu, C. R. Yang, H. W. Chen, C. L. Fu, W. J. Leng

Research output: Contribution to journal › Article › peer-review

27 Scopus citations

Abstract

As an interlayer in the gradient layers such as AlN/Ti/TiN/DLC prepared by plasma-based ion implantation (PBII) on 2024 aluminum alloy, titanium layer plays an important role in enhancing adhesion, reducing thermal stress, limiting the crack propagation, etc. A series of dual-layers prepared by PBII with nitrogen then titanium at various sputtering currents of titanium target on 2024 aluminum alloy have been reported in this paper. The composition distributions and the chemical states are analyzed using X-ray photoelectron spectroscopy (XPS). The structures are studied with grazing X-ray diffraction (GXRD). The results show that PBII with titanium strongly depends on the sputtering current. It is found that there exists a critical sputtering current corresponding only to a titanium-implanted layer containing TiAl ₃ . When the sputtering current exceeds the critical value, a titanium-deposited layer rich in α-Ti is formed on a titanium-implanted layer. By controlling the sputtering current an appropriate titanium interlayer can be prepared to meet the requirement of forming a proper gradient layer.

Original language	English
Pages (from-to)	71-76
Number of pages	6
Journal	Applied Surface Science
Volume	240
Issue number	1-4
DOIs	https://doi.org/10.1016/j.apsusc.2004.06.145
State	Published - 15 Feb 2005
Externally published	Yes

Keywords

Interlayer
Plasma-based ion implantation
Sputtering current

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10.1016/j.apsusc.2004.06.145

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title = "Structural characteristics of 2024 aluminum alloy plasma-based ion implanted with nitrogen then titanium",

abstract = " As an interlayer in the gradient layers such as AlN/Ti/TiN/DLC prepared by plasma-based ion implantation (PBII) on 2024 aluminum alloy, titanium layer plays an important role in enhancing adhesion, reducing thermal stress, limiting the crack propagation, etc. A series of dual-layers prepared by PBII with nitrogen then titanium at various sputtering currents of titanium target on 2024 aluminum alloy have been reported in this paper. The composition distributions and the chemical states are analyzed using X-ray photoelectron spectroscopy (XPS). The structures are studied with grazing X-ray diffraction (GXRD). The results show that PBII with titanium strongly depends on the sputtering current. It is found that there exists a critical sputtering current corresponding only to a titanium-implanted layer containing TiAl 3 . When the sputtering current exceeds the critical value, a titanium-deposited layer rich in α-Ti is formed on a titanium-implanted layer. By controlling the sputtering current an appropriate titanium interlayer can be prepared to meet the requirement of forming a proper gradient layer.",

keywords = "Interlayer, Plasma-based ion implantation, Sputtering current",

author = "Liao, {J. X.} and Xia, {L. F.} and Sun, {M. R.} and Liu, {W. M.} and T. Xu and Yang, {C. R.} and Chen, {H. W.} and Fu, {C. L.} and Leng, {W. J.}",

year = "2005",

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day = "15",

doi = "10.1016/j.apsusc.2004.06.145",

language = "英语",

volume = "240",

pages = "71--76",

journal = "Applied Surface Science",

issn = "0169-4332",

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TY - JOUR

T1 - Structural characteristics of 2024 aluminum alloy plasma-based ion implanted with nitrogen then titanium

AU - Liao, J. X.

AU - Xia, L. F.

AU - Sun, M. R.

AU - Liu, W. M.

AU - Xu, T.

AU - Yang, C. R.

AU - Chen, H. W.

AU - Fu, C. L.

AU - Leng, W. J.

PY - 2005/2/15

Y1 - 2005/2/15

N2 - As an interlayer in the gradient layers such as AlN/Ti/TiN/DLC prepared by plasma-based ion implantation (PBII) on 2024 aluminum alloy, titanium layer plays an important role in enhancing adhesion, reducing thermal stress, limiting the crack propagation, etc. A series of dual-layers prepared by PBII with nitrogen then titanium at various sputtering currents of titanium target on 2024 aluminum alloy have been reported in this paper. The composition distributions and the chemical states are analyzed using X-ray photoelectron spectroscopy (XPS). The structures are studied with grazing X-ray diffraction (GXRD). The results show that PBII with titanium strongly depends on the sputtering current. It is found that there exists a critical sputtering current corresponding only to a titanium-implanted layer containing TiAl 3 . When the sputtering current exceeds the critical value, a titanium-deposited layer rich in α-Ti is formed on a titanium-implanted layer. By controlling the sputtering current an appropriate titanium interlayer can be prepared to meet the requirement of forming a proper gradient layer.

AB - As an interlayer in the gradient layers such as AlN/Ti/TiN/DLC prepared by plasma-based ion implantation (PBII) on 2024 aluminum alloy, titanium layer plays an important role in enhancing adhesion, reducing thermal stress, limiting the crack propagation, etc. A series of dual-layers prepared by PBII with nitrogen then titanium at various sputtering currents of titanium target on 2024 aluminum alloy have been reported in this paper. The composition distributions and the chemical states are analyzed using X-ray photoelectron spectroscopy (XPS). The structures are studied with grazing X-ray diffraction (GXRD). The results show that PBII with titanium strongly depends on the sputtering current. It is found that there exists a critical sputtering current corresponding only to a titanium-implanted layer containing TiAl 3 . When the sputtering current exceeds the critical value, a titanium-deposited layer rich in α-Ti is formed on a titanium-implanted layer. By controlling the sputtering current an appropriate titanium interlayer can be prepared to meet the requirement of forming a proper gradient layer.

KW - Interlayer

KW - Plasma-based ion implantation

KW - Sputtering current

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DO - 10.1016/j.apsusc.2004.06.145

M3 - 文章

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VL - 240

SP - 71

EP - 76

JO - Applied Surface Science

JF - Applied Surface Science

IS - 1-4

ER -

Structural characteristics of 2024 aluminum alloy plasma-based ion implanted with nitrogen then titanium

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Keywords

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