Abstract
Silicon-based nonlinear metasurfaces were implemented only with third-order nonlinearity due to the crystal centrosymmetry and the efficiencies are considerably low, which hinders their practical applications with low-power lasers. Here, we propose to integrate a two-dimensional GaSe flake onto a silicon metasurface to assist high-efficiency second-order nonlinear processes, including second-harmonic generation (SHG) and sum-frequency generation (SFG). By resonantly pumping the integrated GaSe metasurface, which supports a Fano resonance, second-order nonlinear processes in the GaSe layer are strongly enhanced. The obtained SHG from the GaSe metasurface is about two orders of magnitude stronger than the third-harmonic generation from the bare silicon metasurface. In addition, thanks to the resonant field enhancement and GaSe's strong second-order nonlinearity, SHG of the integrated structure could be excited successfully with a low-power continuous-wave laser, which makes it possible to further implement SFG. The high-efficiency second-order nonlinear processes assisted by the two-dimensional materials present potentials to expand functionalities of silicon metasurfaces in nonlinear regime.
Original language | English |
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Pages (from-to) | 2252-2259 |
Number of pages | 8 |
Journal | ACS Photonics |
Volume | 6 |
Issue number | 9 |
DOIs | |
State | Published - 18 Sep 2019 |
Keywords
- Fano resonance
- cavity enhancement
- second harmonic generation
- silicon metasurface
- sum-frequency generation
- two-dimensional material