TY - JOUR
T1 - ReS2 Nanosheet-Based Channels for Two-Dimensional Field Effect Transistors and Phototransistors with High Photoresponsivity
AU - Li, Wei
AU - Jia, Qingrui
AU - Dong, Hongjiao
AU - Wang, Zi’ang
AU - Wang, Yucheng
AU - Wu, Yupan
AU - Zhao, Xiaodong
AU - Chen, Zhao
AU - Wang, Shaoxi
N1 - Publisher Copyright:
© 2022 American Chemical Society.
PY - 2023/1/13
Y1 - 2023/1/13
N2 - Compared to traditional bulk materials, two-dimensional transition metal dichalcogenides (2D TMDCs) hold the potential in low power logic, photoelectric, and nonvolatile memory devices due to a tunable band structure, pure heterojunction interface, and photodetection for a wide spectral range. ReS2 is chosen as the channel material in our work because it possesses excellent photoresponsivity. In addition, a BN dielectric is inserted between SiO2 and ReS2 as a gate dielectric. The pure heterojunction interface at BN/ReS2 enhances the electric characteristics, including negligible hysteresis window and higher mobility. The photoelectric measurement results show that ReS2 devices with or without the BN dielectric have an outstanding photoresponsivity of up to ∼106 A/W and a specific detectivity of up to ∼1013 Jones as well as a fast photoresponse time of less than 100 ms under an extremely low optical power density of 0.47 μW/cm2, which fully proves that ReS2 has the ability to detect very weak light. Also, the contact resistance and Schottky barrier height are also extracted with variable temperature measurements for the ReS2 device. The higher contact resistance and unsymmetric output currents illustrate that the mirror force is the main factor leading to the reduction of the Schottky barrier height. Finally, the influences of the ReS2 channel thickness on mobility and photoresponsivity are also studied by the device-to-device variability. The work in this paper further demonstrates that nanosheet-based ReS2 can be regarded as an excellent candidate for application into the field of light-sensitive sensors under the condition of the CMOS-compatible process.
AB - Compared to traditional bulk materials, two-dimensional transition metal dichalcogenides (2D TMDCs) hold the potential in low power logic, photoelectric, and nonvolatile memory devices due to a tunable band structure, pure heterojunction interface, and photodetection for a wide spectral range. ReS2 is chosen as the channel material in our work because it possesses excellent photoresponsivity. In addition, a BN dielectric is inserted between SiO2 and ReS2 as a gate dielectric. The pure heterojunction interface at BN/ReS2 enhances the electric characteristics, including negligible hysteresis window and higher mobility. The photoelectric measurement results show that ReS2 devices with or without the BN dielectric have an outstanding photoresponsivity of up to ∼106 A/W and a specific detectivity of up to ∼1013 Jones as well as a fast photoresponse time of less than 100 ms under an extremely low optical power density of 0.47 μW/cm2, which fully proves that ReS2 has the ability to detect very weak light. Also, the contact resistance and Schottky barrier height are also extracted with variable temperature measurements for the ReS2 device. The higher contact resistance and unsymmetric output currents illustrate that the mirror force is the main factor leading to the reduction of the Schottky barrier height. Finally, the influences of the ReS2 channel thickness on mobility and photoresponsivity are also studied by the device-to-device variability. The work in this paper further demonstrates that nanosheet-based ReS2 can be regarded as an excellent candidate for application into the field of light-sensitive sensors under the condition of the CMOS-compatible process.
KW - photoresponsivity
KW - phototransistors
KW - ReS
KW - ReS/BN heterojunctions
KW - Schottky barrier height
UR - http://www.scopus.com/inward/record.url?scp=85144341055&partnerID=8YFLogxK
U2 - 10.1021/acsanm.2c04600
DO - 10.1021/acsanm.2c04600
M3 - 文章
AN - SCOPUS:85144341055
SN - 2574-0970
VL - 6
SP - 512
EP - 522
JO - ACS Applied Nano Materials
JF - ACS Applied Nano Materials
IS - 1
ER -