Research on stability diagrams for BCl3-C3H6-H2 system

Yongsheng Liu, Shanhua Liu, Xinzhang Zuo, Litong Zhang, Laifei Cheng, Qingfeng Zeng

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

The stability thermodynamic diagrams for BCl3-C3H6-H2 system were calculated. The effects of reactant partial pressure, total pressure, and deposition temperature on product types and distribution regions of reacted solid products in the stable diagrams were discussed. The results are as follows: (1) the most important factor affecting deposit types and distribution regions of reacted solid products is total pressure. With the increase of total pressure, the stability diagram becomes complex; the region of elementary boron increases; the regions of B+B4C and B4C+C decrease; the region of B4C shows no significant change; and the distribution regions of all deposits shift to the right side of the diagrams. (2) The element content in the deposits from the solid product reaction would be influenced by the reactant partial pressure. The compositions of deposits change from high boron contained to high carbon contained with the increase of C3H6 pressure, namely, from B or B+B4C region to B4C+C region. (3) The deposition temperature has no obvious influence within the temperature range of 800-1200°C, which indicates that the deposition process is not controlled by thermodynamic factors.

Original languageEnglish
Pages (from-to)964-968
Number of pages5
JournalKuei Suan Jen Hsueh Pao/Journal of the Chinese Ceramic Society
Volume38
Issue number5
StatePublished - May 2010

Keywords

  • Boron trichloride-propylene-hydrogen system
  • Chemical vapor deposition
  • Deposition temperature
  • Gas partial pressure
  • Thermodynamic diagram
  • Total pressure

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