Removal function of computerized numerical controlled chemical polishing based on the Marangoni interface effect

Jing Hou; Qiao Xu; Xiang Yang Lei; Li Shu Zhou; Qing Hua Zhang; Jian Wang

Removal function of computerized numerical controlled chemical polishing based on the Marangoni interface effect

Jing Hou, Qiao Xu, Xiang Yang Lei, Li Shu Zhou, Qing Hua Zhang, Jian Wang

Chengdu Fine Optical Engineering Research Center

Research output: Contribution to journal › Article › peer-review

7 Scopus citations

Abstract

Based on the Marangoni interface effect, the theory and test of the removal function of numerically controlled chemical polishing are studied. Wet etching of optics surface is adopted in large optical components manufacture. Before the optical components test, the roughness of the optical components, measured by WKYO apparatus, is 0.72 nm; after the test, the roughness is 0.71 nm. Based on the Preston supposition, the theory and the removal function of numerically controlled chemical polishing are setup. The removal function curve of small tool polishing is Gauss-like.

Original language	English
Pages (from-to)	555-558
Number of pages	4
Journal	Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams
Volume	17
Issue number	4
State	Published - Apr 2005
Externally published	Yes

Keywords

Chemical polishing
Marangoni interface effect
Numerically controlled chemical polishing
Removal function

Cite this

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title = "Removal function of computerized numerical controlled chemical polishing based on the Marangoni interface effect",

abstract = "Based on the Marangoni interface effect, the theory and test of the removal function of numerically controlled chemical polishing are studied. Wet etching of optics surface is adopted in large optical components manufacture. Before the optical components test, the roughness of the optical components, measured by WKYO apparatus, is 0.72 nm; after the test, the roughness is 0.71 nm. Based on the Preston supposition, the theory and the removal function of numerically controlled chemical polishing are setup. The removal function curve of small tool polishing is Gauss-like.",

keywords = "Chemical polishing, Marangoni interface effect, Numerically controlled chemical polishing, Removal function",

author = "Jing Hou and Qiao Xu and Lei, {Xiang Yang} and Zhou, {Li Shu} and Zhang, {Qing Hua} and Jian Wang",

year = "2005",

month = apr,

language = "英语",

volume = "17",

pages = "555--558",

journal = "Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams",

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publisher = "Editorial Office of High Power Laser and Particle Beams",

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TY - JOUR

T1 - Removal function of computerized numerical controlled chemical polishing based on the Marangoni interface effect

AU - Hou, Jing

AU - Xu, Qiao

AU - Lei, Xiang Yang

AU - Zhou, Li Shu

AU - Zhang, Qing Hua

AU - Wang, Jian

PY - 2005/4

Y1 - 2005/4

N2 - Based on the Marangoni interface effect, the theory and test of the removal function of numerically controlled chemical polishing are studied. Wet etching of optics surface is adopted in large optical components manufacture. Before the optical components test, the roughness of the optical components, measured by WKYO apparatus, is 0.72 nm; after the test, the roughness is 0.71 nm. Based on the Preston supposition, the theory and the removal function of numerically controlled chemical polishing are setup. The removal function curve of small tool polishing is Gauss-like.

AB - Based on the Marangoni interface effect, the theory and test of the removal function of numerically controlled chemical polishing are studied. Wet etching of optics surface is adopted in large optical components manufacture. Before the optical components test, the roughness of the optical components, measured by WKYO apparatus, is 0.72 nm; after the test, the roughness is 0.71 nm. Based on the Preston supposition, the theory and the removal function of numerically controlled chemical polishing are setup. The removal function curve of small tool polishing is Gauss-like.

KW - Chemical polishing

KW - Marangoni interface effect

KW - Numerically controlled chemical polishing

KW - Removal function

UR - http://www.scopus.com/inward/record.url?scp=20444383116&partnerID=8YFLogxK

M3 - 文章

AN - SCOPUS:20444383116

SN - 1001-4322

VL - 17

SP - 555

EP - 558

JO - Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams

JF - Qiangjiguang Yu Lizishu/High Power Laser and Particle Beams

IS - 4

ER -

Removal function of computerized numerical controlled chemical polishing based on the Marangoni interface effect

Abstract

Keywords

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