Parametric analysis of vertical incidence reflectivity of conformal PML

Y. J. Zhang, X. H. Zhang, Y. T. Duan, H. Lan

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

2 Scopus citations

Abstract

The vertical incidence reflectivity of conformai perfectly matched layer (PML) is an essential property that can demonstrate partly the error and efficiency of absorbing boundary condition (ABC). To design the high-performance conformal PML, some parametric analysis of vertical incidence reflectivity is implemented in this paper. By deducing and solving the recursion relation of reflection coefficient of multilayer conformal PML, the influence trends of basic parameters on the reflection coefficient of multilayer spherical PML are obtained. It is proved that this parametric analysis approach is reliable and valuable for creating the ideal conformal PML.

Original languageEnglish
Title of host publication2017 International Applied Computational Electromagnetics Society Symposium in China, ACES-China 2017
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9780996007856
StatePublished - 26 Sep 2017
Event2017 International Applied Computational Electromagnetics Society Symposium in China, ACES-China 2017 - Suzhou, China
Duration: 1 Aug 20174 Aug 2017

Publication series

Name2017 International Applied Computational Electromagnetics Society Symposium in China, ACES-China 2017

Conference

Conference2017 International Applied Computational Electromagnetics Society Symposium in China, ACES-China 2017
Country/TerritoryChina
CitySuzhou
Period1/08/174/08/17

Keywords

  • conformai perfectly matched layer
  • parametric analysis
  • reflectivity
  • vertical incidence

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