Abstract
The aim of the paper is to study the phase composition and the mullitization behavior of the Al2O3-SiO2 coating deposited by CVD at 550°C using AlCl3-SiCl4-H2-CO2 precursor gaseous. The DTA and XRD were used to examine the mullitization behavior of the coating. The as-deposited coating was composed of γ-Al2O3 and amorphous SiO2. The DTA curve has four peaks. The very weak exothermic peak appeared at about 793°C represented the formation of mullite. The first sharp exothermic peak appeared at about 984°C represented the formation of δ-Al2O3. The very weak endothermic peak appeared at about 1240°C represented the formation of α-Al2O3. The second sharp exothermic peak appeared at about 13371 also represented the formation of mullite. The results indicate the CVD process was no-oxidation and the Al2O3-SiO2 coating can become into mullite-alumina coating by heat-treating it at 1350°C for 2 h.
| Original language | English |
|---|---|
| Pages (from-to) | 34-37 |
| Number of pages | 4 |
| Journal | Hangkong Cailiao Xuebao/Journal of Aeronautical Materials |
| Volume | 25 |
| Issue number | 5 |
| State | Published - Oct 2005 |
Keywords
- AlO-SiO
- Coating
- CVD
- Mullitization behavior