Large area fabrication of high aspect ratio nano-cylinders on micro-pillars based on a colloidal crystal mask

Zexiang Yan, Ying Wang, Xingchang Zeng, Jiangbo Lu, Xianglian Lv, Weizheng Yuan, Yang He

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

The combination of microstructures and nanostructures has broad application prospects. However, most existing methods are oriented to fabricating microstructures and nanostructures separately, and the fabrication of nanostructures on a microstructured surface at the wafer level is rarely studied. In this work, a new method of fabricating large-area high aspect ratio nano-cylinders on micro-pillars based on a colloidal crystal mask is proposed. An experimental device for stripping and draining was designed to create a polystyrene colloidal crystal mask. Together with reactive-ion etching and metal-assisted chemical etching, high aspect ratio nano-cylinders on micro-pillars with controllable size were obtained on a 4-inch silicon wafer. Wetting tests were performed on four groups of fabricated structures of different sizes, and the results showed that all samples were superhydrophobic. Thus, a method for fabricating uniform, size-controllable, large-area high aspect ratio nano-cylinders on micro-pillars with great potential as a superhydrophobic engineering material is proposed.

Original languageEnglish
Pages (from-to)1115-1119
Number of pages5
JournalMicro and Nano Letters
Volume15
Issue number15
DOIs
StatePublished - 30 Dec 2020

Keywords

  • Area fabrication
  • Colloidal crystals
  • Colloids
  • Contact angle
  • Elemental semiconductors
  • Elemental semiconductors
  • Etching
  • Fluid surface energy (surface tension, Interface tension, Angle of contact, Etc.)
  • Hydrophobicity
  • Large-area high aspect ratio nanocylinders
  • Metal-assisted chemical etching
  • Microfabrication
  • Micropillars
  • Microstructured surface
  • Nanofabrication
  • Nanolithography
  • Nanolithography
  • Nanometre-scale semiconductor fabrication technology
  • Nanoparticles
  • Nanostructured materials
  • Nanotubes and nanostructured materials
  • Polystyrene colloidal crystal mask
  • Reactive ion etching
  • Si
  • Silicon
  • Solid surface structure
  • Sputter etching
  • Structure of solid clusters
  • Superhydrophobic engineering material
  • Surface treatment (semiconductor technology)
  • Surface treatment and degradation in semiconductor technology
  • Wetting
  • Wetting tests

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