Abstract
The combination of microstructures and nanostructures has broad application prospects. However, most existing methods are oriented to fabricating microstructures and nanostructures separately, and the fabrication of nanostructures on a microstructured surface at the wafer level is rarely studied. In this work, a new method of fabricating large-area high aspect ratio nano-cylinders on micro-pillars based on a colloidal crystal mask is proposed. An experimental device for stripping and draining was designed to create a polystyrene colloidal crystal mask. Together with reactive-ion etching and metal-assisted chemical etching, high aspect ratio nano-cylinders on micro-pillars with controllable size were obtained on a 4-inch silicon wafer. Wetting tests were performed on four groups of fabricated structures of different sizes, and the results showed that all samples were superhydrophobic. Thus, a method for fabricating uniform, size-controllable, large-area high aspect ratio nano-cylinders on micro-pillars with great potential as a superhydrophobic engineering material is proposed.
Original language | English |
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Pages (from-to) | 1115-1119 |
Number of pages | 5 |
Journal | Micro and Nano Letters |
Volume | 15 |
Issue number | 15 |
DOIs | |
State | Published - 30 Dec 2020 |
Keywords
- Area fabrication
- Colloidal crystals
- Colloids
- Contact angle
- Elemental semiconductors
- Elemental semiconductors
- Etching
- Fluid surface energy (surface tension, Interface tension, Angle of contact, Etc.)
- Hydrophobicity
- Large-area high aspect ratio nanocylinders
- Metal-assisted chemical etching
- Microfabrication
- Micropillars
- Microstructured surface
- Nanofabrication
- Nanolithography
- Nanolithography
- Nanometre-scale semiconductor fabrication technology
- Nanoparticles
- Nanostructured materials
- Nanotubes and nanostructured materials
- Polystyrene colloidal crystal mask
- Reactive ion etching
- Si
- Silicon
- Solid surface structure
- Sputter etching
- Structure of solid clusters
- Superhydrophobic engineering material
- Surface treatment (semiconductor technology)
- Surface treatment and degradation in semiconductor technology
- Wetting
- Wetting tests