Kossel interferences of proton-induced X-ray emission lines to study thin film waveguides

J. P. Zhang; C. Pendenque; K. Le Guen; R. Delaunay; I. Vickridge; D. Schmaus; Q. G. Fu; P. Jonnard

doi:10.1016/j.nimb.2019.05.053

Kossel interferences of proton-induced X-ray emission lines to study thin film waveguides

J. P. Zhang, C. Pendenque, K. Le Guen, R. Delaunay, I. Vickridge, D. Schmaus, Q. G. Fu, P. Jonnard

School of Materials Sience and Engineering

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

PIXE combined in Kossel geometry was developed as a non-destructive structural characterization method of nanometer thin films deposited on Si. The method is applied to study Pt/Fe/Pt and Ta/Cr/Pt thin films designed as X-ray planar waveguides. The intensities of characteristic X-ray emissions versus the detection angle (grazing exit), called Kossel curves, were measured by an energy dispersive X-ray camera. It is found that an interfacial compound is formed in Pt/Fe/Pt waveguide, whereas oxidation and mixing occur in the Ta/Cr/Pt system. It was not possible to obtain the description of the successive layers when considering only grazing incidence x-ray reflectivity. When PIXE-Kossel experiments are considered, supplementary constraints have to be fulfilled when fitting the values of the stack parameters (number, composition, thickness, roughness and density of the layers)which restrict the possible descriptions of waveguides. Thus PIXE-Kossel is suitable to characterize stacks of nanometer thin films designed as an x-ray waveguide.

Original language	English
Pages (from-to)	12-20
Number of pages	9
Journal	Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume	452
DOIs	https://doi.org/10.1016/j.nimb.2019.05.053
State	Published - 1 Aug 2019

Keywords

Kossel diffraction
PIXE
Thin film
X-ray reflectometry
X-ray waveguide

Access to Document

10.1016/j.nimb.2019.05.053

Cite this

Zhang, J. P., Pendenque, C., Guen, K. L., Delaunay, R., Vickridge, I., Schmaus, D., Fu, Q. G., & Jonnard, P. (2019). Kossel interferences of proton-induced X-ray emission lines to study thin film waveguides. Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, 452, 12-20. https://doi.org/10.1016/j.nimb.2019.05.053

@article{8fd60afdac7a40a295613fe731753e25,

title = "Kossel interferences of proton-induced X-ray emission lines to study thin film waveguides",

abstract = "PIXE combined in Kossel geometry was developed as a non-destructive structural characterization method of nanometer thin films deposited on Si. The method is applied to study Pt/Fe/Pt and Ta/Cr/Pt thin films designed as X-ray planar waveguides. The intensities of characteristic X-ray emissions versus the detection angle (grazing exit), called Kossel curves, were measured by an energy dispersive X-ray camera. It is found that an interfacial compound is formed in Pt/Fe/Pt waveguide, whereas oxidation and mixing occur in the Ta/Cr/Pt system. It was not possible to obtain the description of the successive layers when considering only grazing incidence x-ray reflectivity. When PIXE-Kossel experiments are considered, supplementary constraints have to be fulfilled when fitting the values of the stack parameters (number, composition, thickness, roughness and density of the layers)which restrict the possible descriptions of waveguides. Thus PIXE-Kossel is suitable to characterize stacks of nanometer thin films designed as an x-ray waveguide.",

keywords = "Kossel diffraction, PIXE, Thin film, X-ray reflectometry, X-ray waveguide",

author = "Zhang, {J. P.} and C. Pendenque and Guen, {K. Le} and R. Delaunay and I. Vickridge and D. Schmaus and Fu, {Q. G.} and P. Jonnard",

note = "Publisher Copyright: {\textcopyright} 2019 Elsevier B.V.",

year = "2019",

month = aug,

day = "1",

doi = "10.1016/j.nimb.2019.05.053",

language = "英语",

volume = "452",

pages = "12--20",

journal = "Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms",

issn = "0168-583X",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Kossel interferences of proton-induced X-ray emission lines to study thin film waveguides

AU - Zhang, J. P.

AU - Pendenque, C.

AU - Guen, K. Le

AU - Delaunay, R.

AU - Vickridge, I.

AU - Schmaus, D.

AU - Fu, Q. G.

AU - Jonnard, P.

PY - 2019/8/1

Y1 - 2019/8/1

N2 - PIXE combined in Kossel geometry was developed as a non-destructive structural characterization method of nanometer thin films deposited on Si. The method is applied to study Pt/Fe/Pt and Ta/Cr/Pt thin films designed as X-ray planar waveguides. The intensities of characteristic X-ray emissions versus the detection angle (grazing exit), called Kossel curves, were measured by an energy dispersive X-ray camera. It is found that an interfacial compound is formed in Pt/Fe/Pt waveguide, whereas oxidation and mixing occur in the Ta/Cr/Pt system. It was not possible to obtain the description of the successive layers when considering only grazing incidence x-ray reflectivity. When PIXE-Kossel experiments are considered, supplementary constraints have to be fulfilled when fitting the values of the stack parameters (number, composition, thickness, roughness and density of the layers)which restrict the possible descriptions of waveguides. Thus PIXE-Kossel is suitable to characterize stacks of nanometer thin films designed as an x-ray waveguide.

AB - PIXE combined in Kossel geometry was developed as a non-destructive structural characterization method of nanometer thin films deposited on Si. The method is applied to study Pt/Fe/Pt and Ta/Cr/Pt thin films designed as X-ray planar waveguides. The intensities of characteristic X-ray emissions versus the detection angle (grazing exit), called Kossel curves, were measured by an energy dispersive X-ray camera. It is found that an interfacial compound is formed in Pt/Fe/Pt waveguide, whereas oxidation and mixing occur in the Ta/Cr/Pt system. It was not possible to obtain the description of the successive layers when considering only grazing incidence x-ray reflectivity. When PIXE-Kossel experiments are considered, supplementary constraints have to be fulfilled when fitting the values of the stack parameters (number, composition, thickness, roughness and density of the layers)which restrict the possible descriptions of waveguides. Thus PIXE-Kossel is suitable to characterize stacks of nanometer thin films designed as an x-ray waveguide.

KW - Kossel diffraction

KW - PIXE

KW - Thin film

KW - X-ray reflectometry

KW - X-ray waveguide

UR - http://www.scopus.com/inward/record.url?scp=85066081936&partnerID=8YFLogxK

U2 - 10.1016/j.nimb.2019.05.053

DO - 10.1016/j.nimb.2019.05.053

M3 - 文章

AN - SCOPUS:85066081936

SN - 0168-583X

VL - 452

SP - 12

EP - 20

JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

ER -

Kossel interferences of proton-induced X-ray emission lines to study thin film waveguides

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this