Investigation of boron nitride prepared by low pressure chemical vapor deposition at 650∼1200 °C

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

4 Scopus citations

Abstract

BN coatings were deposited on carbon substrates by low-pressure chemical vapor depositionin a large temperature range of 650∼1200 °C, employing BCl3-NH3-H2 reaction system. The effects of depositing temperature on the yield, control step of deposition progress (deposition mechanism), microstructure, and crystallization degree of BN coating were investigated. Results show that BN deposition rate first increases and then decreases as the rising temperature and the maximum deposition rate occurs at 900∼1000°C. By the determination of the Arrenius relationship, there are three temperature regions with different active energies and controlled by different deposition mechanisms, i.e. chemical reaction, mass transport and depletion of reactants. Through the surface morphology observation by scanning electron microscopy, chemical composition analyses by energy dispersion spectroscopy and crystallization degree and grain size comparison by Raman spectroscopy, it can be drawn that interphase-used BN is suitable to be deposited at 1000 °C.

Original languageEnglish
Title of host publicationInorganic Thin Films and Coatings
PublisherTrans Tech Publications Ltd
Pages58-62
Number of pages5
ISBN (Print)9783037855669
DOIs
StatePublished - 2013
Event2012 Workshop on Inorganic Thin Films and Coatings - Guilin, China
Duration: 16 Jul 201218 Jul 2012

Publication series

NameKey Engineering Materials
Volume537
ISSN (Print)1013-9826
ISSN (Electronic)1662-9795

Conference

Conference2012 Workshop on Inorganic Thin Films and Coatings
Country/TerritoryChina
CityGuilin
Period16/07/1218/07/12

Keywords

  • Boron nitride
  • Chemical vapor deposition
  • Deposition mechanism
  • Kinetics
  • Thermodynamics

Fingerprint

Dive into the research topics of 'Investigation of boron nitride prepared by low pressure chemical vapor deposition at 650∼1200 °C'. Together they form a unique fingerprint.

Cite this