Abstract
ZnO thin films are deposited on Si substrate by radio frequency (RF) magnetron sputtering technique. By XRD, AFM, and Grating-Spectrometer,the influence of annealing temperature on structural characteristics, the stress, morphology and optical properties for ZnO films are studied. The results show that the ZnO films with RF power (100W) and annealing temperature (600°C) can obtain its best c-axis orientation and the smallest FWHM, and the film possessed the lower surface roughness and the higher transmission.
| Original language | English |
|---|---|
| Pages (from-to) | 102-106 |
| Number of pages | 5 |
| Journal | Fangzhi Gaoxiao Jichukexue Xuebao |
| Volume | 22 |
| Issue number | 1 |
| State | Published - Mar 2009 |
| Externally published | Yes |
Keywords
- AFM
- Annealing temperature
- Transmission
- XRD
- ZnO thin films