Gradient lithography using graded tip array

Jin Wu, Kai Tao, Jianmin Miao

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Large-area patterned surfaces with chemical and/or morphological gradients have significant applications in biology, chemistry and materials science. In this work, a new strategy is developed to create the polydimethylsiloxane (PDMS) tip array with graded apex size, which is employed to fabricate gradient patterns with the lateral feature sizes changing from sub-100 nm to several microns on one single substrate over macroscopic (cm2) areas. The gradient structures can be produced in both near-field photolithography and soft contact printing. The formation of gradient feature size is ascribed to gradient contact areas between tips and substrates. This lithography strategy combines the advantages of a wide range of feature sizes, simplicity, high-throughput, low-cost and diversified feature shapes, making it a facile and flexible approach to manufacture various functional gradient structures.

Original languageEnglish
Title of host publicationTRANSDUCERS 2017 - 19th International Conference on Solid-State Sensors, Actuators and Microsystems
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages1312-1315
Number of pages4
ISBN (Electronic)9781538627310
DOIs
StatePublished - 26 Jul 2017
Event19th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2017 - Kaohsiung, Taiwan, Province of China
Duration: 18 Jun 201722 Jun 2017

Publication series

NameTRANSDUCERS 2017 - 19th International Conference on Solid-State Sensors, Actuators and Microsystems

Conference

Conference19th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2017
Country/TerritoryTaiwan, Province of China
CityKaohsiung
Period18/06/1722/06/17

Keywords

  • contact printing
  • graded
  • Gradient patterns
  • PDMS tip array
  • photolithography
  • soft lithography

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