Fabrications of Nb-doped TiO2 (TNO) transparent conductive oxide polycrystalline films on glass substrates by sol-gel method

Liang Zhao; Xiaoru Zhao; Jinming Liu; An Zhang; Danhong Wang; Bingbo Wei

doi:10.1007/s10971-009-2102-3

Fabrications of Nb-doped TiO² (TNO) transparent conductive oxide polycrystalline films on glass substrates by sol-gel method

Liang Zhao, Xiaoru Zhao, Jinming Liu, An Zhang, Danhong Wang, Bingbo Wei

School of Physical Science and Technology

Northwestern Polytechnical University Xian

Research output: Contribution to journal › Article › peer-review

35 Scopus citations

Abstract

Anatase Ti_0.94Nb_0.06O₂ (TNO) films were fabricated on glass substrates by sol-gel method using a dipcoating technique. The annealing treatment was separated into two steps, first in air at 350-550 °C for 1 h and then in vacuum of 4.0 9 10^-4 Pa at 550 °C for 1 h. The influence of vacuum annealing treatment to the electrical and optical properties was discussed. Especially, the role of air annealing treatment from 350 to 550 °C on the crystallization and the structure of the films was analyzed. It is proved that the films annealed at 550 °C in air and then 550 °C in vacuum exhibited the minimum resistivity of 19.3 XΩcm and the average optical transmittance of about 75% in the visible range, indicating that the sol-gel method is a feasible and promising method to fabricate TNO films.

Original language	English
Pages (from-to)	475-479
Number of pages	5
Journal	Journal of Sol-Gel Science and Technology
Volume	53
Issue number	2
DOIs	https://doi.org/10.1007/s10971-009-2102-3
State	Published - Feb 2010

Keywords

Air annealing treatment
Dip-coating
Nb-doped TiO (TNO)
Sol-gel
Vacuum annealing treatment

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10.1007/s10971-009-2102-3

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title = "Fabrications of Nb-doped TiO2 (TNO) transparent conductive oxide polycrystalline films on glass substrates by sol-gel method",

abstract = "Anatase Ti0.94Nb0.06O2 (TNO) films were fabricated on glass substrates by sol-gel method using a dipcoating technique. The annealing treatment was separated into two steps, first in air at 350-550 °C for 1 h and then in vacuum of 4.0 9 10-4 Pa at 550 °C for 1 h. The influence of vacuum annealing treatment to the electrical and optical properties was discussed. Especially, the role of air annealing treatment from 350 to 550 °C on the crystallization and the structure of the films was analyzed. It is proved that the films annealed at 550 °C in air and then 550 °C in vacuum exhibited the minimum resistivity of 19.3 XΩcm and the average optical transmittance of about 75% in the visible range, indicating that the sol-gel method is a feasible and promising method to fabricate TNO films.",

keywords = "Air annealing treatment, Dip-coating, Nb-doped TiO (TNO), Sol-gel, Vacuum annealing treatment",

author = "Liang Zhao and Xiaoru Zhao and Jinming Liu and An Zhang and Danhong Wang and Bingbo Wei",

year = "2010",

month = feb,

doi = "10.1007/s10971-009-2102-3",

language = "英语",

volume = "53",

pages = "475--479",

journal = "Journal of Sol-Gel Science and Technology",

issn = "0928-0707",

publisher = "Springer Netherlands",

number = "2",

}

TY - JOUR

T1 - Fabrications of Nb-doped TiO2 (TNO) transparent conductive oxide polycrystalline films on glass substrates by sol-gel method

AU - Zhao, Liang

AU - Zhao, Xiaoru

AU - Liu, Jinming

AU - Zhang, An

AU - Wang, Danhong

AU - Wei, Bingbo

PY - 2010/2

Y1 - 2010/2

N2 - Anatase Ti0.94Nb0.06O2 (TNO) films were fabricated on glass substrates by sol-gel method using a dipcoating technique. The annealing treatment was separated into two steps, first in air at 350-550 °C for 1 h and then in vacuum of 4.0 9 10-4 Pa at 550 °C for 1 h. The influence of vacuum annealing treatment to the electrical and optical properties was discussed. Especially, the role of air annealing treatment from 350 to 550 °C on the crystallization and the structure of the films was analyzed. It is proved that the films annealed at 550 °C in air and then 550 °C in vacuum exhibited the minimum resistivity of 19.3 XΩcm and the average optical transmittance of about 75% in the visible range, indicating that the sol-gel method is a feasible and promising method to fabricate TNO films.

AB - Anatase Ti0.94Nb0.06O2 (TNO) films were fabricated on glass substrates by sol-gel method using a dipcoating technique. The annealing treatment was separated into two steps, first in air at 350-550 °C for 1 h and then in vacuum of 4.0 9 10-4 Pa at 550 °C for 1 h. The influence of vacuum annealing treatment to the electrical and optical properties was discussed. Especially, the role of air annealing treatment from 350 to 550 °C on the crystallization and the structure of the films was analyzed. It is proved that the films annealed at 550 °C in air and then 550 °C in vacuum exhibited the minimum resistivity of 19.3 XΩcm and the average optical transmittance of about 75% in the visible range, indicating that the sol-gel method is a feasible and promising method to fabricate TNO films.

KW - Air annealing treatment

KW - Dip-coating

KW - Nb-doped TiO (TNO)

KW - Sol-gel

KW - Vacuum annealing treatment

UR - http://www.scopus.com/inward/record.url?scp=77951666838&partnerID=8YFLogxK

U2 - 10.1007/s10971-009-2102-3

DO - 10.1007/s10971-009-2102-3

M3 - 文章

AN - SCOPUS:77951666838

SN - 0928-0707

VL - 53

SP - 475

EP - 479

JO - Journal of Sol-Gel Science and Technology

JF - Journal of Sol-Gel Science and Technology

IS - 2

ER -

Fabrications of Nb-doped TiO² (TNO) transparent conductive oxide polycrystalline films on glass substrates by sol-gel method

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Keywords

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