TY - JOUR
T1 - Fabrication and characterization of copper-indium-diselenide (CuInSe2, CIS) thin film using one-step electro-deposition process
AU - Li, Libo
AU - Ma, Yue
AU - Gao, Guanxiong
AU - Wang, Wentao
AU - Guo, Shaowen
AU - You, Jun
AU - Xie, Jingchen
N1 - Publisher Copyright:
© 2015 Elsevier B.V.
PY - 2016/2/15
Y1 - 2016/2/15
N2 - We had successfully fabricated CuInSe2 (CIS) thin film by electro-deposition technique. Electro-deposited ternary selenide precursor was thermally annealed under nitrogen conditions to form CuInSe2 films. The structure, composition, chemical state and optical characterization of CuInSe2 films were measured using several techniques, including Scanning electron microscopy (SEM), Atomic force microscopy (AFM), Atomic emission spectroscopy (AES), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Ultraviolet Spectrophotometry (UV) and electrochemical workstation. The results showed that the CuInSe2 thin films formed using electro-deposition had dense grain structure whose size was various with the increase of the deposited voltage and annealing temperature. The band gap of CuInSe2 was 1.43 eV when deposition voltage was 1.7 V, and CIS film exhibited the most excellent property.
AB - We had successfully fabricated CuInSe2 (CIS) thin film by electro-deposition technique. Electro-deposited ternary selenide precursor was thermally annealed under nitrogen conditions to form CuInSe2 films. The structure, composition, chemical state and optical characterization of CuInSe2 films were measured using several techniques, including Scanning electron microscopy (SEM), Atomic force microscopy (AFM), Atomic emission spectroscopy (AES), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Ultraviolet Spectrophotometry (UV) and electrochemical workstation. The results showed that the CuInSe2 thin films formed using electro-deposition had dense grain structure whose size was various with the increase of the deposited voltage and annealing temperature. The band gap of CuInSe2 was 1.43 eV when deposition voltage was 1.7 V, and CIS film exhibited the most excellent property.
KW - CuInSe
KW - Electro-deposition
KW - Photovoltaic
KW - Thin film solar cells
UR - http://www.scopus.com/inward/record.url?scp=84947571170&partnerID=8YFLogxK
U2 - 10.1016/j.jallcom.2015.11.005
DO - 10.1016/j.jallcom.2015.11.005
M3 - 文章
AN - SCOPUS:84947571170
SN - 0925-8388
VL - 658
SP - 774
EP - 779
JO - Journal of Alloys and Compounds
JF - Journal of Alloys and Compounds
ER -