Effects of Doping on the Morphology and Infrared Radiative Properties of Black Silicon

Sreyash Sarkar, Tarik Bourouina, Elyes Nefzaoui, Ahmed A. Elsayed, Frederic Marty, Jeremie Drevillon, Yasser M. Sabry, Jiancun Zhao, Yiting Yu, Elodie Richalot, Philippe Basset

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

3 Scopus citations

Abstract

For the first time, we show that the density of nanostructures on Black Silicon obtained by wafer-level cryogenic plasma processing increases with a high level of doping, extending the spectral range of its very high absorptivity from near-infrared to far-infrared. We have found experimentally and confirmed by simulations that, for highly doped Black Silicon, a high absorptivity is observed till 15 μm. Subsequent processing of SEM images reveals that these noteworthy radiative properties are probably due to particular morphological features of heavily doped Black Silicon at the nano-scale. These features are quantified through statistical image processing. Reported results pave the way to highly integrated and effective infrared sources using Black Silicon.

Original languageEnglish
Title of host publicationTHERMINIC 2019 - 2019 25th International Workshop Thermal Investigations of ICs and Systems
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781728120782
DOIs
StatePublished - Sep 2019
Event25th International Workshop on Thermal Investigations of ICs and Systems, THERMINIC 2019 - Lecco, Italy
Duration: 25 Sep 201927 Sep 2019

Publication series

NameTHERMINIC 2019 - 2019 25th International Workshop Thermal Investigations of ICs and Systems

Conference

Conference25th International Workshop on Thermal Investigations of ICs and Systems, THERMINIC 2019
Country/TerritoryItaly
CityLecco
Period25/09/1927/09/19

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