Effect of deposition temperature on boron-doped carbon coatings deposited from a BCl 3 -C 3 H 6 -H 2 mixture using low pressure chemical vapor deposition

Yongsheng Liu, Litong Zhang, Laifei Cheng, Wenbin Yang, Yongdong Xu

Research output: Contribution to journalArticlepeer-review

39 Scopus citations

Abstract

A mixture of propylene, hydrogen and boron trichloride was used to fabricate boron-doped carbon coatings by using low pressure chemical vapor deposition (LPCVD) technique. Effect of deposition temperature on deposition rate, morphologies, compositions and bonding states of boron-doped carbon coatings was investigated. Below 1273 K, the deposition rate is controlled by reaction dynamics. The deposition rate increases with increasing deposition temperature. The activation energy is 208.74 kJ/mol. Above 1273 K, the deposition rate decreases due to smaller critical radius r c and higher nuclei formation rate J with increasing temperature. Scanning electron microscopy shows that the structure changes from glass-like to nano-laminates with increasing deposition temperature. The boron concentration decreases with increasing deposition temperature, corresponding with increasing carbon concentration. The five types of bonding states are B-C, B-sub-C, BC 2 O, BCO 2 and B-O. B-sub-C and BC 2 O are the main bonding states. The reactions are dominant at all temperatures, in which the B-sub-C and PyC are formed.

Original languageEnglish
Pages (from-to)8761-8768
Number of pages8
JournalApplied Surface Science
Volume255
Issue number21
DOIs
StatePublished - 15 Aug 2009

Keywords

  • Bonding states
  • Boron-doped carbon
  • Deposition temperature
  • LPCVD
  • Morphologies

Fingerprint

Dive into the research topics of 'Effect of deposition temperature on boron-doped carbon coatings deposited from a BCl 3 -C 3 H 6 -H 2 mixture using low pressure chemical vapor deposition'. Together they form a unique fingerprint.

Cite this