Effect of C/B ratio in reactants on low-pressure CVD boron-doped carbon deposited from a BCl3-C3H6-H2 mixture

Yongsheng Liu, Litong Zhang, Laifei Cheng, Wenbin Yang, Yongdong Xu, Qingfeng Zeng

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Propylene was used to fabricate boron-doped carbon coatings by low-pressure chemical vapor deposition. The effects of carbon/boron (C/B) ratio in reactants on the deposition rate, morphologies, and bonding states of the deposits were investigated. Deposition rate increased with increasing C/B ratio, when C/B ratio was less than 4.0. Then, deposition rate decreased with increasing C/B ratio. The maximum rate was 500 nm/h. SEM results showed that cross section morphologies and thickness of deposits were influenced by C/B ratio. Morphologies were compact and not-delaminated with a low C/B ratio, however nanoscale delamination occurred in the deposits with a high C/B ratio. The infiltration characteristic was also influenced by the C/B ratio. The suitable C/B ratio was 1.0-2.0 for infiltration in a T300 carbon bundle. XPS results showed that carbon content is major in the deposits with all C/B ratios. The boron contents decreased and carbon contents increased with increasing C/B ratio. B-sub-C and BC2O were main bonding states. The total contents of B-sub-C and BC2O were above 60.0 at.% with all C/B ratios.

Original languageEnglish
Pages (from-to)509-515
Number of pages7
JournalJournal of Coatings Technology and Research
Volume6
Issue number4
DOIs
StatePublished - Dec 2009

Keywords

  • Boron-doped carbon
  • C/B ratio
  • Low-pressure chemical vapor deposition

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