TY - JOUR
T1 - Dissociative adsorption of methanethiol on Cu(111) surface
T2 - A density functional theory study
AU - Fan, Xiao Li
AU - Liu, Yan
AU - Du, Xiu Juan
AU - Liu, Chong
AU - Zhang, Chao
PY - 2013
Y1 - 2013
N2 - The interaction of methanethiol (CH3SH) molecules with the Cu(111) surface was investigated using a first-principles method based on density functional theory, and a slab model. A series of possible adsorption configurations constructed using S atoms on different sites with different tilt angles were studied. It was found for the fi rst time that the non-dissociative molecular adsorption of CH3SH on the Cu(111) surface with the S atom sitting on the top site belongs to the weak chemisorption, and the adsorption energy is 0.39 eV. After the dissociation of the S-H bond, the S atom is located at the bridge site, with a small shift toward the hollow site. The dissociative adsorption structure is thermodynamically more stable than the intact one, and the adsorption energy is 0.75-0.77 eV. Two reaction pathways have been studied for the transition from non-dissociative adsorption to dissociative adsorption, and the activation energy barrier along the minimum energy path is 0.57 eV. The results of the calculations indicated that the released H atom prefers to form a bond with the copper surface, rather than desorbing in the H2 molecular form. Comparing the local density of states of S atoms in the single CH3SH, CH3SH/ Cu(111), and CH3S/Cu(111) structures, we found that the bonding between the S atoms and the substrate is much stronger in the dissociated adsorption states.
AB - The interaction of methanethiol (CH3SH) molecules with the Cu(111) surface was investigated using a first-principles method based on density functional theory, and a slab model. A series of possible adsorption configurations constructed using S atoms on different sites with different tilt angles were studied. It was found for the fi rst time that the non-dissociative molecular adsorption of CH3SH on the Cu(111) surface with the S atom sitting on the top site belongs to the weak chemisorption, and the adsorption energy is 0.39 eV. After the dissociation of the S-H bond, the S atom is located at the bridge site, with a small shift toward the hollow site. The dissociative adsorption structure is thermodynamically more stable than the intact one, and the adsorption energy is 0.75-0.77 eV. Two reaction pathways have been studied for the transition from non-dissociative adsorption to dissociative adsorption, and the activation energy barrier along the minimum energy path is 0.57 eV. The results of the calculations indicated that the released H atom prefers to form a bond with the copper surface, rather than desorbing in the H2 molecular form. Comparing the local density of states of S atoms in the single CH3SH, CH3SH/ Cu(111), and CH3S/Cu(111) structures, we found that the bonding between the S atoms and the substrate is much stronger in the dissociated adsorption states.
KW - Adsorption geometry
KW - Cu(111) surface
KW - Density functional theory
KW - Dissociation
KW - Local density of states
KW - Methanethiol molecule
UR - http://www.scopus.com/inward/record.url?scp=84874547552&partnerID=8YFLogxK
U2 - 10.3866/PKU.WHXB201211231
DO - 10.3866/PKU.WHXB201211231
M3 - 文章
AN - SCOPUS:84874547552
SN - 1000-6818
VL - 29
SP - 263
EP - 270
JO - Wuli Huaxue Xuebao/ Acta Physico - Chimica Sinica
JF - Wuli Huaxue Xuebao/ Acta Physico - Chimica Sinica
IS - 2
ER -