Abstract
Precipitation and dissolution of γNb 5 Si 3 precipitates in an Nb-Ti-Si based alloy has been visualized by atomic-scale in-situ heating transmission electron microscopy. Nanoscale γNb 5 Si 3 precipitates nucleate inside Nbss around 850 °C with two orientation relationships (ORs): (200) Nb //11¯00 γ (OR-I) and 101¯ Nb //11¯00 γ (OR-II). Growth and dissolution of the two orientational γNb 5 Si 3 precipitates are promoted by motion of atomic steps and facets at interfaces. Precipitates along OR-I is less stable than that of OR-II, adopting dissolution temperature of 1125 °C and 1250 °C respectively. The orientational stability of γNb 5 Si 3 precipitates, which is correlated with planar disregistry, affects their evolution behavior directly upon heating.
Original language | English |
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Pages (from-to) | 86-90 |
Number of pages | 5 |
Journal | Scripta Materialia |
Volume | 164 |
DOIs | |
State | Published - 15 Apr 2019 |
Keywords
- In-situ heating TEM
- Interfaces
- Nb-Ti-Si based alloy
- Orientational stability
- Precipitation