CVD Al2O3-SiO2 compound and the mechanism investigation

Zhaofeng Chen, Litong Zhang, Laifei Cheng, Yongdong Xu, Zhihao Jin

Research output: Contribution to journalArticlepeer-review

Abstract

The composition and microstructures of the Al2O3-SiO2: system coatings fabricated by chemical vapor deposition using AlCl3-SiCl4-H2-CO2: were investigated. The results show that completely compositional homogenization between silica and alumina does not occur under CVD conditions. The products deposited all were the transition Al2O3 attached amorphous SiO2. The size of the Al2O3-SiO2 particles declined with CVD temperature increasing in the range of 550°C-850°C. Dense and crystalline Al2O3·SiO2- α- Al2O3-ι- Al2O3-SiO2 coating was obtained by CVD at 1050°C.

Original languageEnglish
Pages (from-to)609-611
Number of pages3
JournalXiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume33
Issue number6
StatePublished - Jun 2004

Keywords

  • Alumina
  • Chemical vapor deposition
  • Coating
  • Mullite
  • Silica

Fingerprint

Dive into the research topics of 'CVD Al2O3-SiO2 compound and the mechanism investigation'. Together they form a unique fingerprint.

Cite this