Abstract
The composition and microstructures of the Al2O3-SiO2: system coatings fabricated by chemical vapor deposition using AlCl3-SiCl4-H2-CO2: were investigated. The results show that completely compositional homogenization between silica and alumina does not occur under CVD conditions. The products deposited all were the transition Al2O3 attached amorphous SiO2. The size of the Al2O3-SiO2 particles declined with CVD temperature increasing in the range of 550°C-850°C. Dense and crystalline Al2O3·SiO2- α- Al2O3-ι- Al2O3-SiO2 coating was obtained by CVD at 1050°C.
Original language | English |
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Pages (from-to) | 609-611 |
Number of pages | 3 |
Journal | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering |
Volume | 33 |
Issue number | 6 |
State | Published - Jun 2004 |
Keywords
- Alumina
- Chemical vapor deposition
- Coating
- Mullite
- Silica