A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films

Shusheng Xu; Ming Hu; Jiayi Sun; Lijun Weng; Weimin Liu; Xiaoming Gao

doi:10.1016/j.matlet.2018.01.027

A simple strategy to tailor the microstructure and wear-resistance of sputtered WS₂ films

Shusheng Xu, Ming Hu, Jiayi Sun, Lijun Weng, Weimin Liu, Xiaoming Gao

CAS - Lanzhou Institute of Chemical Physics

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

Sputtered WS₂ films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS₂-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS₂ film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS₂ film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS₂ film and the deterioration of tribological properties.

Original language	English
Pages (from-to)	179-181
Number of pages	3
Journal	Materials Letters
Volume	216
DOIs	https://doi.org/10.1016/j.matlet.2018.01.027
State	Published - 1 Apr 2018
Externally published	Yes

Keywords

Physical vapour deposition
Structural
Thin films

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10.1016/j.matlet.2018.01.027

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title = "A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films",

abstract = "Sputtered WS2 films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS2-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS2 film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS2 film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS2 film and the deterioration of tribological properties.",

keywords = "Physical vapour deposition, Structural, Thin films",

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T1 - A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films

AU - Xu, Shusheng

AU - Hu, Ming

AU - Sun, Jiayi

AU - Weng, Lijun

AU - Liu, Weimin

AU - Gao, Xiaoming

PY - 2018/4/1

Y1 - 2018/4/1

N2 - Sputtered WS2 films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS2-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS2 film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS2 film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS2 film and the deterioration of tribological properties.

AB - Sputtered WS2 films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS2-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS2 film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS2 film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS2 film and the deterioration of tribological properties.

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KW - Thin films

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M3 - 文章

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VL - 216

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JO - Materials Letters

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ER -

A simple strategy to tailor the microstructure and wear-resistance of sputtered WS₂ films

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Keywords

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