TY - GEN
T1 - A novel method for the manufacture ofMEMS devices with large exposed area based on SOl wafers
AU - Xie, Jianbing
AU - Yuan, Weizheng
AU - Chang, Honglong
PY - 2009
Y1 - 2009
N2 - This paper describes a novel method of producing released MEMS devices with large exposed area based on SOl wafers. First, we discussed when the notching effect happens, from our experiments, for 30pm SOl wafer, the gap between lines should be below 14pm to initiate notching. Then, the release structure for the large exposed area device is designed, which opens up opportunities for the design of devices with large movement capabilities. A silicon temperature sensor with large exposed area is used to demonstrate the proposed method. Observations of the release structure at various stages of removal confirm our method; the device has been released use the one-step process and the large exposed area cleared without 'grass' effect.
AB - This paper describes a novel method of producing released MEMS devices with large exposed area based on SOl wafers. First, we discussed when the notching effect happens, from our experiments, for 30pm SOl wafer, the gap between lines should be below 14pm to initiate notching. Then, the release structure for the large exposed area device is designed, which opens up opportunities for the design of devices with large movement capabilities. A silicon temperature sensor with large exposed area is used to demonstrate the proposed method. Observations of the release structure at various stages of removal confirm our method; the device has been released use the one-step process and the large exposed area cleared without 'grass' effect.
UR - http://www.scopus.com/inward/record.url?scp=70349680463&partnerID=8YFLogxK
U2 - 10.1109/NEMS.2009.5068571
DO - 10.1109/NEMS.2009.5068571
M3 - 会议稿件
AN - SCOPUS:70349680463
SN - 9781424446308
T3 - 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
SP - 253
EP - 256
BT - 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
T2 - 4th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2009
Y2 - 5 January 2009 through 8 January 2009
ER -