A double-layer Ag/ZnS:Ag/ZnS/ITO memristor device for artificial synapse

Yuwei Cao, Lingyan Xu, Aoqiu Wang, Wanqi Jie

Research output: Contribution to journalArticlepeer-review

Abstract

Intelligent computer capable of learning, memorizing, and flexibly processing information like human brain is one target of future computer development. Memristors are believed to be the key device to break through the von Neumann computer architecture, achieving the fusion of information storage and computation. Chalcogenide material based Ag/ZnS/ITO structure was fabricated by depositing ZnS thin film doped with 12.6 % Ag on ITO. The endurance, data retention, and energy consumption of Ag/ZnS:Ag/ZnS/ITO double-layer devices in DC are superior to Ag/ZnS:Ag/ITO single-layer thin film memristors. Ag conductive filaments were revealed to preferentially perform rupture and rejuvenation in ZnS-Ag intermediate layer, indicating the resistive switching mechanism during the resistive switching process. The Ag/ZnS:Ag/ZnS/ITO double-layer device exhibits short-term synaptic plasticity with a delayed exponential decay of current following voltage pulses, suggesting inertial motion-induced EPSC/IPSC generation. Also, the device's conductance saturation and resistance tuning, akin to biological synapse learning, is achieved through high-energy pulses promoting the formation of conductive filaments. The Ag/ZnS:Ag/ZnS/ITO double-layer device could serve as an optimized electronic synapse for the potential application in the future bionic circuits, holding great promise for advancing the application fields of artificial intelligence and energy-efficient computing systems.

Original languageEnglish
Article number181021
JournalJournal of Alloys and Compounds
Volume1031
DOIs
StatePublished - 5 Jun 2025

Keywords

  • Memristor
  • Resistive switching mechanism
  • Switching storage characteristics
  • Synaptic plasticity
  • ZnS thin film

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