@inproceedings{d35c10e9999e4a4aa24c9006e51bfcf6,
title = "ZnO thin films produced by the RF magnetron sputtering",
abstract = "ZnO thin films with (002) orientation have been deposited on Si(100) substrate by radio frequency (RF) magnetron sputtering technique. The influence of RF power and oxygen ratio on the the grain size-, the residual stress and optical properties was investigated by X-ray diffraction, transmission spectra and photoluminescence spectra. The results show that the ZnO film deposited with sputtering power (100W) and oxygen ratio(60\%), can obtain its best c-axis orientation and crystallization and that tension stress of the film reaches the lowest, and a strong UV photoluminescence(PL) peak and a weak blue emission peak were observed.",
keywords = "RF magnetron sputtering, Visible spectrum, Zinc Oxide Film",
author = "Huawa Yu and Jing Wang and Yangan Yan and Xin Wang and Bin Gao and Hanchen Liu and Yali Du",
year = "2011",
doi = "10.1109/EMEIT.2011.6023604",
language = "英语",
isbn = "9781612840857",
series = "Proceedings of 2011 International Conference on Electronic and Mechanical Engineering and Information Technology, EMEIT 2011",
pages = "2486--2489",
booktitle = "Proceedings of 2011 International Conference on Electronic and Mechanical Engineering and Information Technology, EMEIT 2011",
note = "2011 International Conference on Electronic and Mechanical Engineering and Information Technology, EMEIT 2011 ; Conference date: 12-08-2011 Through 14-08-2011",
}