TY - JOUR
T1 - Uniform design and regression analysis of LPCVD boron carbide from BCl 3 -CH 4 -H 2 system
AU - Liu, Yongsheng
AU - Zhang, Litong
AU - Cheng, Laifei
AU - Zeng, Qingfeng
AU - Zhang, Weihua
AU - Yang, Wenbin
AU - Feng, Zude
AU - Li, Siwei
AU - Zeng, Bin
PY - 2009/3/15
Y1 - 2009/3/15
N2 - Boron carbide was prepared by low pressure chemical vapor deposition (LPCVD) from BCl 3 -CH 4 -H 2 system. The deposition process conditions were optimized through using a uniform design method and regression analysis. The regression model of the deposition rate was established. The influences of deposition temperature (T), deposition time (t), inlet BCl 3 /CH 4 gas ratio (δ), and inlet H 2 /CH 4 gas ratio (θ) on deposition rate and microstructure of the coatings were investigated. The optimized deposition parameters were obtained theoretically. The morphologies, phases, microstructure and composition of deposits were characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman micro-spectroscopy, transmission electron microscopy (TEM), energy dispersive spectra (EDS), and Auger electron spectra (AES), the results showed that different boron carbides were produced by three kinds of deposition mechanisms. Crown
AB - Boron carbide was prepared by low pressure chemical vapor deposition (LPCVD) from BCl 3 -CH 4 -H 2 system. The deposition process conditions were optimized through using a uniform design method and regression analysis. The regression model of the deposition rate was established. The influences of deposition temperature (T), deposition time (t), inlet BCl 3 /CH 4 gas ratio (δ), and inlet H 2 /CH 4 gas ratio (θ) on deposition rate and microstructure of the coatings were investigated. The optimized deposition parameters were obtained theoretically. The morphologies, phases, microstructure and composition of deposits were characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman micro-spectroscopy, transmission electron microscopy (TEM), energy dispersive spectra (EDS), and Auger electron spectra (AES), the results showed that different boron carbides were produced by three kinds of deposition mechanisms. Crown
KW - Boron carbide
KW - CVD
KW - Deposition mechanisms
KW - Microstructure
KW - Uniform design
UR - https://www.scopus.com/pages/publications/61449190638
U2 - 10.1016/j.apsusc.2008.12.075
DO - 10.1016/j.apsusc.2008.12.075
M3 - 文章
AN - SCOPUS:61449190638
SN - 0169-4332
VL - 255
SP - 5729
EP - 5735
JO - Applied Surface Science
JF - Applied Surface Science
IS - 11
ER -