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Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass

  • G. Cheng
  • , K. Mishchik
  • , C. Mauclair
  • , E. Audouard
  • , R. Stoian
  • Laboratoire Hubert Curien, UMR 5516 CNRS, Université de Lyon
  • Université de Lyon

科研成果: 期刊稿件文章同行评审

95 引用 (Scopus)

摘要

Ultrashort pulsed laser irradiation of bulk fused silica may result under specific energetic conditions in the self-organization of subwave-length material redistribution regions within the laser trace. The modulated structures have birefringent properties and show unusual anisotropic light scattering and reflection characteristics. We report here on the formation of waveguiding structures with remarkable polarization effects for infrared light. The photoinscription process using 800 nm femtosecond laser pulses is accompanied by third harmonic generation and polarization dependent anisotropic scattering of UV photons. The photowritten structures can be arranged in three-dimensional patterns generating complex propagation and polarization effects due to the anisotropic optical properties.

源语言英语
页(从-至)9515-9525
页数11
期刊Optics Express
17
12
DOI
出版状态已出版 - 8 6月 2009
已对外发布

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