The effect of chemical polishing treatment on the microstructure, photoelectric properties of CdZnTe polycrystalline films

Yiwei Li; Yawei Wang; Wenyu Zhang; Kun Cao; Yang Li; Gangqiang Zha; Tingting Tan

doi:10.1016/j.mssp.2020.105608

The effect of chemical polishing treatment on the microstructure, photoelectric properties of CdZnTe polycrystalline films

Yiwei Li
, Yawei Wang
, Wenyu Zhang
, Kun Cao
, Yang Li
, Gangqiang Zha
, Tingting Tan

材料学院

State Key Laboratory of Nuclear Power Safety Monitoring Technology and Equipment
Northwestern Polytechnical University Xian

科研成果: 期刊稿件 › 文章 › 同行评审

12 引用（Scopus）

摘要

In this paper, CdZnTe polycrystalline film grown by the close-spaced sublimation (CSS) was chemically polished. Energy dispersive spectrum (EDS), atomic force microscope (AFM), Raman spectroscopy, current-voltage (I–V) characteristics and current-time (I-T) measurements were used to test the effect of the corrosion time of brominated methanol etching solution (with the ratio of CH₃OH:Br₂ = 50:1.5) on the structure, surface morphology and photoelectric properties of CdZnTe polycrystalline films. The results indicate that appropriate chemical polishing time can reduce the surface roughness, surface defects and leakage current of CdZnTe film and improve the photoelectric properties of CdZnTe film.

源语言	英语
文章编号	105608
期刊	Materials Science in Semiconductor Processing
卷	124
DOI	https://doi.org/10.1016/j.mssp.2020.105608
出版状态	已出版 - 15 3月 2021

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10.1016/j.mssp.2020.105608

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title = "The effect of chemical polishing treatment on the microstructure, photoelectric properties of CdZnTe polycrystalline films",

abstract = "In this paper, CdZnTe polycrystalline film grown by the close-spaced sublimation (CSS) was chemically polished. Energy dispersive spectrum (EDS), atomic force microscope (AFM), Raman spectroscopy, current-voltage (I–V) characteristics and current-time (I-T) measurements were used to test the effect of the corrosion time of brominated methanol etching solution (with the ratio of CH3OH:Br2 = 50:1.5) on the structure, surface morphology and photoelectric properties of CdZnTe polycrystalline films. The results indicate that appropriate chemical polishing time can reduce the surface roughness, surface defects and leakage current of CdZnTe film and improve the photoelectric properties of CdZnTe film.",

keywords = "CdZnTe polycrystalline Film, Chemical polishing, Close-spaced sublimation, Photoelectric performance",

author = "Yiwei Li and Yawei Wang and Wenyu Zhang and Kun Cao and Yang Li and Gangqiang Zha and Tingting Tan",

note = "Publisher Copyright: {\textcopyright} 2020 Elsevier Ltd",

year = "2021",

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day = "15",

doi = "10.1016/j.mssp.2020.105608",

language = "英语",

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TY - JOUR

T1 - The effect of chemical polishing treatment on the microstructure, photoelectric properties of CdZnTe polycrystalline films

AU - Li, Yiwei

AU - Wang, Yawei

AU - Zhang, Wenyu

AU - Cao, Kun

AU - Li, Yang

AU - Zha, Gangqiang

AU - Tan, Tingting

PY - 2021/3/15

Y1 - 2021/3/15

N2 - In this paper, CdZnTe polycrystalline film grown by the close-spaced sublimation (CSS) was chemically polished. Energy dispersive spectrum (EDS), atomic force microscope (AFM), Raman spectroscopy, current-voltage (I–V) characteristics and current-time (I-T) measurements were used to test the effect of the corrosion time of brominated methanol etching solution (with the ratio of CH3OH:Br2 = 50:1.5) on the structure, surface morphology and photoelectric properties of CdZnTe polycrystalline films. The results indicate that appropriate chemical polishing time can reduce the surface roughness, surface defects and leakage current of CdZnTe film and improve the photoelectric properties of CdZnTe film.

AB - In this paper, CdZnTe polycrystalline film grown by the close-spaced sublimation (CSS) was chemically polished. Energy dispersive spectrum (EDS), atomic force microscope (AFM), Raman spectroscopy, current-voltage (I–V) characteristics and current-time (I-T) measurements were used to test the effect of the corrosion time of brominated methanol etching solution (with the ratio of CH3OH:Br2 = 50:1.5) on the structure, surface morphology and photoelectric properties of CdZnTe polycrystalline films. The results indicate that appropriate chemical polishing time can reduce the surface roughness, surface defects and leakage current of CdZnTe film and improve the photoelectric properties of CdZnTe film.

KW - CdZnTe polycrystalline Film

KW - Chemical polishing

KW - Close-spaced sublimation

KW - Photoelectric performance

UR - https://www.scopus.com/pages/publications/85097321532

U2 - 10.1016/j.mssp.2020.105608

DO - 10.1016/j.mssp.2020.105608

M3 - 文章

AN - SCOPUS:85097321532

SN - 1369-8001

VL - 124

JO - Materials Science in Semiconductor Processing

JF - Materials Science in Semiconductor Processing

M1 - 105608

ER -

The effect of chemical polishing treatment on the microstructure, photoelectric properties of CdZnTe polycrystalline films

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