摘要
The fabrication and the performance of PMMA resistive switching device have been studied by using FR-4 (copper), PMMA (poly methyl methacrylate) and aluminum as the active anode, the solid electrolyte and the inert cathode respectively. By etching the copper surface with the acid solution [4HNO3 + 11H3PO4 (98 %) + 5CH3COOH] at 60 °C for 2 min, a good performance of Cu/PMMA/Al device, which can switch until 2300 cycles, has been realized. The spin rate for forming the PMMA coating plays a decisive role in the performance of Cu/PMMA/Al device. The best performance of the Cu/PMMA/Al device was obtained only when the spin rate of deposition of PMMA reached 4000 rpm (low thickness).
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 1719-1725 |
| 页数 | 7 |
| 期刊 | Microsystem Technologies |
| 卷 | 23 |
| 期 | 6 |
| DOI | |
| 出版状态 | 已出版 - 1 6月 2017 |
学术指纹
探究 'Study and design of resistive switching behaviors in PMMA-based conducting-bridge random-access memory (CBRAM) devices' 的科研主题。它们共同构成独一无二的学术指纹。引用此
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