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Steep-slope vertical-transport transistors built from sub-5 nm Thin van der Waals heterostructures

  • Qiyu Yang
  • , Zheng Dong Luo
  • , Huali Duan
  • , Xuetao Gan
  • , Dawei Zhang
  • , Yuewen Li
  • , Dongxin Tan
  • , Jan Seidel
  • , Wenchao Chen
  • , Yan Liu
  • , Yue Hao
  • , Genquan Han
  • School of Microelectronics, Xidian University
  • Hangzhou Institute of Technology
  • Zhejiang University
  • University of New South Wales

科研成果: 期刊稿件 › 文章 › 同行评审

40 引用 (Scopus)

摘要

Two-dimensional (2D) semiconductor-based vertical-transport field-effect transistors (VTFETs) – in which the current flows perpendicularly to the substrate surface direction – are in the drive to surmount the stringent downscaling constraints faced by the conventional planar FETs. However, low-power device operation with a sub-60 mV/dec subthreshold swing (SS) at room temperature along with an ultra-scaled channel length remains challenging for 2D semiconductor-based VTFETs. Here, we report steep-slope VTFETs that combine a gate-controllable van der Waals heterojunction and a metal-filamentary threshold switch (TS), featuring a vertical transport channel thinner than 5 nm and sub-thermionic turn-on characteristics. The integrated TS-VTFETs were realised with efficient current switching behaviours, exhibiting a current modulation ratio exceeding 1 × 108 and an average sub-60 mV/dec SS over 6 decades of drain current. The proposed TS-VTFETs with excellent area- and energy-efficiency could help to tackle the performance degradation-device downscaling dilemma faced by logic transistor technologies.

源语言英语
期刊Nature Communications
卷15
期1
DOI
出版状态已出版 - 12月 2024

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