TY - JOUR
T1 - Research on stability diagrams for BCl3-C3H6-H2 system
AU - Liu, Yongsheng
AU - Liu, Shanhua
AU - Zuo, Xinzhang
AU - Zhang, Litong
AU - Cheng, Laifei
AU - Zeng, Qingfeng
PY - 2010/5
Y1 - 2010/5
N2 - The stability thermodynamic diagrams for BCl3-C3H6-H2 system were calculated. The effects of reactant partial pressure, total pressure, and deposition temperature on product types and distribution regions of reacted solid products in the stable diagrams were discussed. The results are as follows: (1) the most important factor affecting deposit types and distribution regions of reacted solid products is total pressure. With the increase of total pressure, the stability diagram becomes complex; the region of elementary boron increases; the regions of B+B4C and B4C+C decrease; the region of B4C shows no significant change; and the distribution regions of all deposits shift to the right side of the diagrams. (2) The element content in the deposits from the solid product reaction would be influenced by the reactant partial pressure. The compositions of deposits change from high boron contained to high carbon contained with the increase of C3H6 pressure, namely, from B or B+B4C region to B4C+C region. (3) The deposition temperature has no obvious influence within the temperature range of 800-1200°C, which indicates that the deposition process is not controlled by thermodynamic factors.
AB - The stability thermodynamic diagrams for BCl3-C3H6-H2 system were calculated. The effects of reactant partial pressure, total pressure, and deposition temperature on product types and distribution regions of reacted solid products in the stable diagrams were discussed. The results are as follows: (1) the most important factor affecting deposit types and distribution regions of reacted solid products is total pressure. With the increase of total pressure, the stability diagram becomes complex; the region of elementary boron increases; the regions of B+B4C and B4C+C decrease; the region of B4C shows no significant change; and the distribution regions of all deposits shift to the right side of the diagrams. (2) The element content in the deposits from the solid product reaction would be influenced by the reactant partial pressure. The compositions of deposits change from high boron contained to high carbon contained with the increase of C3H6 pressure, namely, from B or B+B4C region to B4C+C region. (3) The deposition temperature has no obvious influence within the temperature range of 800-1200°C, which indicates that the deposition process is not controlled by thermodynamic factors.
KW - Boron trichloride-propylene-hydrogen system
KW - Chemical vapor deposition
KW - Deposition temperature
KW - Gas partial pressure
KW - Thermodynamic diagram
KW - Total pressure
UR - https://www.scopus.com/pages/publications/77953244818
M3 - 文章
AN - SCOPUS:77953244818
SN - 0454-5648
VL - 38
SP - 964
EP - 968
JO - Kuei Suan Jen Hsueh Pao/Journal of the Chinese Ceramic Society
JF - Kuei Suan Jen Hsueh Pao/Journal of the Chinese Ceramic Society
IS - 5
ER -