TY - JOUR
T1 - Process of continuous membrane micro-deformable mirror based on SOI wafer
AU - Qiao, Dayong
AU - Yuan, Weizheng
AU - Tian, Li
PY - 2009/12
Y1 - 2009/12
N2 - Silicon on insulator (SOI) provides a three-layer structure of Si/SiO2/Si, and makes it possible to achieve continuous membrane micro-deformable mirror based on deep reactive ion etching (DRIE). By using the SiO2 as the self-stop layer of dry etching, a single crystal silicon reflective mirror membrane can be readily realized with uniform and precisely controlled thickness. A process based on DRIE and anodic bonding of SOI wafer/Pyrex 7740 glass was presented, and a micro-deformable mirror with 69 actuators was fabricated and tested. The micro-deformable mirror, with an aperture of 10 mm, exhibits a working range of 4.25 μm, a PV flatness of 1.2 μm and a RMS roughness of 193 nm.
AB - Silicon on insulator (SOI) provides a three-layer structure of Si/SiO2/Si, and makes it possible to achieve continuous membrane micro-deformable mirror based on deep reactive ion etching (DRIE). By using the SiO2 as the self-stop layer of dry etching, a single crystal silicon reflective mirror membrane can be readily realized with uniform and precisely controlled thickness. A process based on DRIE and anodic bonding of SOI wafer/Pyrex 7740 glass was presented, and a micro-deformable mirror with 69 actuators was fabricated and tested. The micro-deformable mirror, with an aperture of 10 mm, exhibits a working range of 4.25 μm, a PV flatness of 1.2 μm and a RMS roughness of 193 nm.
KW - Adaptive optics
KW - Micro-deformable mirror
KW - Optical fabrication
KW - Silicon on insulator
UR - https://www.scopus.com/pages/publications/77349120077
U2 - 10.3788/CJL200936s2.0078
DO - 10.3788/CJL200936s2.0078
M3 - 文章
AN - SCOPUS:77349120077
SN - 0258-7025
VL - 36
SP - 78
EP - 82
JO - Zhongguo Jiguang/Chinese Journal of Lasers
JF - Zhongguo Jiguang/Chinese Journal of Lasers
IS - SUPPL. 2
ER -