摘要
To overcome the critical issue of low density of the MoSi2 coating prepared by slurry sintering method, a novel strategy of adding diffusion barrier (DB) at the interface was developed to achieve a high density of the coating. The effect of sintering process on the density and microstructure of the MoSi2 coating was investigated systematically. The addition of DB promotes the formation of dense MoSi2 coatings with a low area porosity of 0.96–3.98 %, while the value is basically over 41 % for the coatings without DB. The MoSi2 coating with DB shows an enhanced oxidation resistance due to its dense structure as well as the reduction of the inward diffusion loss of Si by the DB during oxidation.
| 源语言 | 英语 |
|---|---|
| 文章编号 | 130427 |
| 期刊 | Surface and Coatings Technology |
| 卷 | 478 |
| DOI | |
| 出版状态 | 已出版 - 29 2月 2024 |
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