摘要
A point defect model for the binary compound CdTe proposed in a former paper is generalized to Cd1-xZnxTe. In Cd 0.95Zn0.05Te crystals, Cdi ̇̇ is found to be the main point defect at high Cd partial pressures, and V″Cd at low partial pressures. On the Te-rich side, the concentrations of Tecȧ̇ and Te cȧ are sufficiently high to significantly influence the electrical properties of Cd0.95Zn0.05Te. Excess Te in Te-rich crystals may result in ionized Cd vacancies and Te anti-sites while excess Cd in Cd-rich Cd0.95Zn0.05Te may exist as Cd interstitials. A detailed recipe for the post-growth annealing of Cd 0.95Zn0.05Te is suggested following calculations based on the model.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 219-224 |
| 页数 | 6 |
| 期刊 | Journal of Crystal Growth |
| 卷 | 257 |
| 期 | 3-4 |
| DOI | |
| 出版状态 | 已出版 - 10月 2003 |
指纹
探究 'Point defects in Cd0.95Zn0.05Te' 的科研主题。它们共同构成独一无二的指纹。引用此
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