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Oxygen adsorption on Ag/Si (111) -7×7 surfaces

  • Zhen Zhang
  • , Jian Jiao
  • , Zhiquan Jiang
  • , Dali Tan
  • , Qiang Fu
  • , Xinhe Bao
  • , Xi Liu
  • , Jinfeng Jia
  • , Qikun Xue
  • CAS - Dalian Institute of Chemical Physics
  • CAS - Institute of Physics
  • Tsinghua University

科研成果: 期刊稿件文章同行评审

5 引用 (Scopus)

摘要

The growth of Ag clusters on Si (111) -7×7 surfaces was studied by scanning tunneling microscopy (STM), ultraviolet photoelectron spectroscopy, and x-ray photoelectron spectroscopy (XPS). A shift in the Ag 3d binding energy and a noticeable change in the valence-band structure reveal a significant modification of the electronic states of the Si (111) -7×7 surface and the dispersed Ag clusters, which had a strong dependence on the coverage of Ag. Furthermore, these Ag clusters deposited on the Si surface alter the behavior of oxygen adsorption on the Si (111) -7×7 surface. As evidenced by XPS, the presence of Ag inhibits the adsorbed surface oxygen species, the ins-ins and ad-ins oxygen, in which "ad" denotes an O atom bonding on top of the Si adatom and "ins" denotes an O atom inserted into a Si adatom back bond. The STM and high-resolution electron energy loss spectroscopy results show that the ins-ins oxygen species are more significantly suppressed by the Ag clusters compared to the ad-ins oxygen.

源语言英语
页(从-至)62-67
页数6
期刊Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
26
1
DOI
出版状态已出版 - 2008
已对外发布

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