@inproceedings{a2dd4f53a73e47cca235893dade530fa,
title = "Manufacturing Silicon-Nanowire Based Piezoresistive Force Sensors with Top-Down Stepwise Controllable Etching Process",
abstract = "Reported giant piezoresistive effect of silicon nanowires (SiNWs) motivates research of SiNWs-based devices, particularly for inertial and force sensors, whose fabrication however remains a challenge. This paper reports a controllable manufacturing process to fabricate a force sensor utilizing <600 nm × 600 nm SiNWs with a GF of 35 as the sensing element while 10 μ m thick comb fingers as the actuator and force generator. Different from the previous bottom-up process using epitaxial growth, this work proposes a straightforward top-down process with stepwise controllable etching and only ultraviolet lithography to integrate SiNWs of which minimum diameter is 100nm with the 10 μ m thick actuator. A fabricated force sensor demonstrates a sensitivity of 508 p± μ N and linearity of ± 1.4\%.",
keywords = "Silicon nanowire, force sensor, giant piezoresistive effect, monolithic manufacturing",
author = "Geer Teng and Junbo Guo and Ziming Yang and Xin Li and Xiaoying Li and Yongcun Hao and Weizheng Yuan and Honglong Chang and Hemin Zhang",
note = "Publisher Copyright: {\textcopyright} 2026 IEEE.; 39th IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2026 ; Conference date: 25-01-2026 Through 29-01-2026",
year = "2026",
doi = "10.1109/MEMS64181.2026.11419243",
language = "英语",
series = "Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
pages = "1159--1162",
booktitle = "2026 IEEE 39th International Conference on Micro Electro Mechanical Systems, MEMS 2026",
}