摘要
The electrical properties of different metal-cadmium-zinc-telluride (CdZnTe) contacts produced by sputtering deposition method are investigated. The results of current-voltage and SEM analyses show that Au is the most suitable electrical contact material, which forms nearly ideal Ohmicity contact with high resistivity p-CdZnTe:In crystals and a 0.95 ± 0.02 eV barrier height with low resistivity ones. Passivation treatment can decrease the leakage current. XPS analyses show that Au atoms diffused into CdZnTe:In during annealing, meanwhile Cd and Te atoms diffuse into the Au contact. Diffused Au atoms do not form any compound with any element in CdZnTe:In crystal, but subsitute Cd sites or occupy Cd vacancies as acceptors. Thus, a heavy p-type doping layer is formed, and M-p+-p Ohmic contact is obtained.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 15-19 |
| 页数 | 5 |
| 期刊 | Materials Science and Engineering: B |
| 卷 | 135 |
| 期 | 1 |
| DOI | |
| 出版状态 | 已出版 - 15 11月 2006 |
指纹
探究 'Investigation on the electrical properties of metal-Cd0.9Zn0.1Te contacts' 的科研主题。它们共同构成独一无二的指纹。引用此
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