跳到主要导航 跳到搜索 跳到主要内容

Initial decomposition of methyltrichlorosilane in the chemical vapor deposition of silicon-carbide

  • Northwestern Polytechnical University Xian

科研成果: 期刊稿件文章同行评审

12 引用 (Scopus)

摘要

All of the possible initial decomposition pathways in the CVD process of preparing silicon carbides with CH3SiCl3-H2 precursors were searched theoretically. The geometries of the species were optimized with B3PW91/6-311G(d,p). The energy barriers and the reaction energies were evaluated with the accurate model chemistry at G3(MP2) level after a non-dynamical electronic correlation detection. The Gibbs free energies at 298.15K and 1200K for all the possible elementary reactions, including both direct decomposition and the radical attacking dissociations for MTS were reported. Nine transition states are firstly reported in initial decomposition of MTS. Comparisons with a previous theoretical study are excellent, but additional reactions studied here are found to be relevant as well.

源语言英语
页(从-至)265-272
页数8
期刊Computational and Theoretical Chemistry
967
2-3
DOI
出版状态已出版 - 1 8月 2011

指纹

探究 'Initial decomposition of methyltrichlorosilane in the chemical vapor deposition of silicon-carbide' 的科研主题。它们共同构成独一无二的指纹。

引用此