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Influence of Gate Dimensions on High Power Microwave Injection Effects for AlGaAs/GaAs pHEMT

  • Xuanlin Wang
  • , Yue Diao
  • , Wei Li
  • , Shiyue Wu
  • , Fan Bi
  • , Jiaxi Zhang
  • , Kaiyu Chen
  • , Yufei Lu
  • , Yucheng Wang
  • , Shaoxi Wang
  • Northwestern Polytechnical University Xian
  • Institute of Guizhou Aerospace Measuring and Testing Technology

科研成果: 期刊稿件文章同行评审

3 引用 (Scopus)

摘要

High-power microwaves (HPM) coupled into the RF front-ends through antennas pose a significant threat to the low-noise amplifier (LNA). As the core component of the LNA, the reliability of pHEMT devices faces major challenges. This paper presents a comprehensive study on the performance variations of pHEMT devices with different gate lengths during HPM injection, using TCAD simulation. The study compares the temperature variation, electric field distribution, and current density across devices with varying gate lengths under HPM injection conditions. The findings reveal that, regardless of the gate length, hotspots consistently form in the gate-source access region during HPM injection, with this region being the first to experience thermal failure. Notably, as the gate length increases, the peak temperature in the device under HPM injection exhibits a distinct decreasing trend, highlighting the significant impact of gate length on device performance under high-power microwave conditions. This analysis provides new insights into the thermal management and reliability of HEMT devices in high-power applications, emphasizing the crucial role of gate length in mitigating thermal failure.

源语言英语
期刊论文编号e70128
期刊International Journal of Numerical Modelling: Electronic Networks, Devices and Fields
38
6
DOI
出版状态已出版 - 1 11月 2025

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