Influence of annealing temperature on properties of ZnO films

Hua Wa Yu; Ya Li Du; Jing Wang; Xiang An Yan; Bing Gao

Influence of annealing temperature on properties of ZnO films

Hua Wa Yu
, Ya Li Du
, Jing Wang
, Xiang An Yan
, Bing Gao

Xi'an Polytechnic University

科研成果: 期刊稿件 › 文章 › 同行评审

1 引用（Scopus）

摘要

ZnO thin films are deposited on Si substrate by radio frequency (RF) magnetron sputtering technique. By XRD, AFM, and Grating-Spectrometer,the influence of annealing temperature on structural characteristics, the stress, morphology and optical properties for ZnO films are studied. The results show that the ZnO films with RF power (100W) and annealing temperature (600°C) can obtain its best c-axis orientation and the smallest FWHM, and the film possessed the lower surface roughness and the higher transmission.

源语言	英语
页（从-至）	102-106
页数	5
期刊	Fangzhi Gaoxiao Jichukexue Xuebao
卷	22
期	1
出版状态	已出版 - 3月 2009
已对外发布	是

其它文件与链接

链接到 Scopus 的出版物

引用此

@article{9613aaca77444546ae9b5957978db26f,

title = "Influence of annealing temperature on properties of ZnO films",

abstract = "ZnO thin films are deposited on Si substrate by radio frequency (RF) magnetron sputtering technique. By XRD, AFM, and Grating-Spectrometer,the influence of annealing temperature on structural characteristics, the stress, morphology and optical properties for ZnO films are studied. The results show that the ZnO films with RF power (100W) and annealing temperature (600°C) can obtain its best c-axis orientation and the smallest FWHM, and the film possessed the lower surface roughness and the higher transmission.",

keywords = "AFM, Annealing temperature, Transmission, XRD, ZnO thin films",

author = "Yu, \{Hua Wa\} and Du, \{Ya Li\} and Jing Wang and Yan, \{Xiang An\} and Bing Gao",

year = "2009",

month = mar,

language = "英语",

volume = "22",

pages = "102--106",

journal = "Fangzhi Gaoxiao Jichukexue Xuebao",

issn = "1006-8341",

publisher = "Xi'an Polytechnic University",

number = "1",

}

TY - JOUR

T1 - Influence of annealing temperature on properties of ZnO films

AU - Yu, Hua Wa

AU - Du, Ya Li

AU - Wang, Jing

AU - Yan, Xiang An

AU - Gao, Bing

PY - 2009/3

Y1 - 2009/3

N2 - ZnO thin films are deposited on Si substrate by radio frequency (RF) magnetron sputtering technique. By XRD, AFM, and Grating-Spectrometer,the influence of annealing temperature on structural characteristics, the stress, morphology and optical properties for ZnO films are studied. The results show that the ZnO films with RF power (100W) and annealing temperature (600°C) can obtain its best c-axis orientation and the smallest FWHM, and the film possessed the lower surface roughness and the higher transmission.

AB - ZnO thin films are deposited on Si substrate by radio frequency (RF) magnetron sputtering technique. By XRD, AFM, and Grating-Spectrometer,the influence of annealing temperature on structural characteristics, the stress, morphology and optical properties for ZnO films are studied. The results show that the ZnO films with RF power (100W) and annealing temperature (600°C) can obtain its best c-axis orientation and the smallest FWHM, and the film possessed the lower surface roughness and the higher transmission.

KW - AFM

KW - Annealing temperature

KW - Transmission

KW - XRD

KW - ZnO thin films

UR - https://www.scopus.com/pages/publications/65449124732

M3 - 文章

AN - SCOPUS:65449124732

SN - 1006-8341

VL - 22

SP - 102

EP - 106

JO - Fangzhi Gaoxiao Jichukexue Xuebao

JF - Fangzhi Gaoxiao Jichukexue Xuebao

IS - 1

ER -

Influence of annealing temperature on properties of ZnO films

摘要

其它文件与链接

指纹

引用此