摘要
A high-temperature anisotropic silicon-etching strategy is demonstrated to steer the growth of the horizontally localized parallel Zn2SiO 4 nanowires.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 3786-3788 |
| 页数 | 3 |
| 期刊 | Chemical Communications |
| 期 | 25 |
| DOI | |
| 出版状态 | 已出版 - 2009 |
| 已对外发布 | 是 |
学术指纹
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