TY - GEN
T1 - Fuzzy predictive R2R control to CMP process
AU - Wang, Liang
AU - Hu, Jingtao
PY - 2011
Y1 - 2011
N2 - For chemical mechanical polishing (CMP) process characteristics of nonlinear, time-varying and not easily being in-situ measured, this paper proposes a CMP process fuzzy predictive run-to-run (R2R) controller named FPR2R. CMP T-S fuzzy predictive model is off-line and on-line identified by algorithms of fuzzy clustering and recursive least squares with forgetting factor, thus problem of constructing accurate mathematical model of complicated CMP is solved and error of modeling is reduced. Recipe is calculated by multivariable generalized predictive control (GPC) method, therefore it improves control precision. Simulation results illustrate that proposed CMP FPR2R controller is better than EWMA control scheme about performance, variation in various runs of products is reduced substantially, process drifts and shifts is suppressed significantly. Compared to EWMA, root mean squared error for material removal rate(MRR) is decreased.
AB - For chemical mechanical polishing (CMP) process characteristics of nonlinear, time-varying and not easily being in-situ measured, this paper proposes a CMP process fuzzy predictive run-to-run (R2R) controller named FPR2R. CMP T-S fuzzy predictive model is off-line and on-line identified by algorithms of fuzzy clustering and recursive least squares with forgetting factor, thus problem of constructing accurate mathematical model of complicated CMP is solved and error of modeling is reduced. Recipe is calculated by multivariable generalized predictive control (GPC) method, therefore it improves control precision. Simulation results illustrate that proposed CMP FPR2R controller is better than EWMA control scheme about performance, variation in various runs of products is reduced substantially, process drifts and shifts is suppressed significantly. Compared to EWMA, root mean squared error for material removal rate(MRR) is decreased.
KW - chemical mechanical polishing
KW - generalized predictive control
KW - run-to-run control
KW - semiconductor manufacturing
KW - T-S fuzzy predictive model
UR - https://www.scopus.com/pages/publications/80051880567
U2 - 10.1109/CSAE.2011.5952412
DO - 10.1109/CSAE.2011.5952412
M3 - 会议稿件
AN - SCOPUS:80051880567
SN - 9781424487257
T3 - Proceedings - 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011
SP - 6
EP - 10
BT - Proceedings - 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011
T2 - 2011 IEEE International Conference on Computer Science and Automation Engineering, CSAE 2011
Y2 - 10 June 2011 through 12 June 2011
ER -