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Electron localization morphology of the stacking faults in Mg: A first-principles study

  • W. Y. Wang
  • , S. L. Shang
  • , Y. Wang
  • , K. A. Darling
  • , S. N. Mathaudhu
  • , X. D. Hui
  • , Z. K. Liu

科研成果: 期刊稿件文章同行评审

37 引用 (Scopus)

摘要

Electron localization morphologies of growth, deformation, and extrinsic faults of hcp Mg are calculated, yielding quantitative descriptions of charge transfer between atoms in and out of the stacking faults. We provide a physical interpretation of the relation between stacking fault energy and the difference of charge density and electron localization function between fault and non-fault planes and show that the stacking fault energy ascends in the order of growth, deformation, and extrinsic faults and is proportional to the square of the difference of maximum deformation charge density, the difference of maximum electron localization function, and the number of faulted layers.

源语言英语
页(从-至)121-125
页数5
期刊Chemical Physics Letters
551
DOI
出版状态已出版 - 1 11月 2012
已对外发布

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