Effects of sputtering power on PtO_x films prepared by reactive magnetron sputtering

PtO_x films have been prepared by reactive magnetron sputtering on glass substrate without external heating and charactered by X-ray diffraction, X-ray photoemission spectrometry and scanning electron microscopy. The fabricated Pt oxides films consist of amorphous PtO and PtO₂ whose chemical composition depends on sputtering power. Effects of sputtering power on the deposition rate, composition, surface morphology, structure, electrical resistivity and adhesion strength of the as-deposited films have been studied. It is found that with the increase of the sputtering power, the deposition rate of the films increases near linearly, and the O/Pt atomic ratio and resistivity decreases. While the adhesion strength of the films first increases and then decreases as the increasing sputtering power. However, it seems that the sputtering power has little influence on the structural and surface morphology of the PtO_x films.