摘要
The microstructural effects of SiC swelling, mechanisms of He diffusion and aggregation in C-rich SiC are studied using an in situ helium ion microscope. The additive carbon interface provides improved swelling resistance in SiC to ∼270 nm, and defect formation is not observed until very high He implantation doses.
| 源语言 | 英语 |
|---|---|
| 页(从-至) | 762-765 |
| 页数 | 4 |
| 期刊 | Nanoscale |
| 卷 | 8 |
| 期 | 2 |
| DOI | |
| 出版状态 | 已出版 - 14 1月 2016 |
学术指纹
探究 'Direct observation of structural and defect evolution in C-rich SiC using in situ helium ion microscopy' 的科研主题。它们共同构成独一无二的学术指纹。引用此
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