CVD Al2O3-SiO2 compound and the mechanism investigation

Zhaofeng Chen; Litong Zhang; Laifei Cheng; Yongdong Xu; Zhihao Jin

CVD Al₂O₃-SiO₂ compound and the mechanism investigation

Zhaofeng Chen
, Litong Zhang
, Laifei Cheng
, Yongdong Xu
, Zhihao Jin

材料学院

Xi'an Jiaotong University
Northwestern Polytechnical University Xian

科研成果: 期刊稿件 › 文章 › 同行评审

摘要

The composition and microstructures of the Al₂O₃-SiO₂: system coatings fabricated by chemical vapor deposition using AlCl₃-SiCl₄-H₂-CO₂: were investigated. The results show that completely compositional homogenization between silica and alumina does not occur under CVD conditions. The products deposited all were the transition Al₂O₃ attached amorphous SiO₂. The size of the Al₂O₃-SiO₂ particles declined with CVD temperature increasing in the range of 550°C-850°C. Dense and crystalline Al₂O₃·SiO₂- α- Al₂O₃-ι- Al₂O₃-SiO₂ coating was obtained by CVD at 1050°C.

源语言	英语
页（从-至）	609-611
页数	3
期刊	Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
卷	33
期	6
出版状态	已出版 - 6月 2004

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引用此

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title = "CVD Al2O3-SiO2 compound and the mechanism investigation",

abstract = "The composition and microstructures of the Al2O3-SiO2: system coatings fabricated by chemical vapor deposition using AlCl3-SiCl4-H2-CO2: were investigated. The results show that completely compositional homogenization between silica and alumina does not occur under CVD conditions. The products deposited all were the transition Al2O3 attached amorphous SiO2. The size of the Al2O3-SiO2 particles declined with CVD temperature increasing in the range of 550°C-850°C. Dense and crystalline Al2O3·SiO2- α- Al2O3-ι- Al2O3-SiO2 coating was obtained by CVD at 1050°C.",

keywords = "Alumina, Chemical vapor deposition, Coating, Mullite, Silica",

author = "Zhaofeng Chen and Litong Zhang and Laifei Cheng and Yongdong Xu and Zhihao Jin",

year = "2004",

month = jun,

language = "英语",

volume = "33",

pages = "609--611",

journal = "Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering",

issn = "1002-185X",

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number = "6",

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TY - JOUR

T1 - CVD Al2O3-SiO2 compound and the mechanism investigation

AU - Chen, Zhaofeng

AU - Zhang, Litong

AU - Cheng, Laifei

AU - Xu, Yongdong

AU - Jin, Zhihao

PY - 2004/6

Y1 - 2004/6

N2 - The composition and microstructures of the Al2O3-SiO2: system coatings fabricated by chemical vapor deposition using AlCl3-SiCl4-H2-CO2: were investigated. The results show that completely compositional homogenization between silica and alumina does not occur under CVD conditions. The products deposited all were the transition Al2O3 attached amorphous SiO2. The size of the Al2O3-SiO2 particles declined with CVD temperature increasing in the range of 550°C-850°C. Dense and crystalline Al2O3·SiO2- α- Al2O3-ι- Al2O3-SiO2 coating was obtained by CVD at 1050°C.

AB - The composition and microstructures of the Al2O3-SiO2: system coatings fabricated by chemical vapor deposition using AlCl3-SiCl4-H2-CO2: were investigated. The results show that completely compositional homogenization between silica and alumina does not occur under CVD conditions. The products deposited all were the transition Al2O3 attached amorphous SiO2. The size of the Al2O3-SiO2 particles declined with CVD temperature increasing in the range of 550°C-850°C. Dense and crystalline Al2O3·SiO2- α- Al2O3-ι- Al2O3-SiO2 coating was obtained by CVD at 1050°C.

KW - Alumina

KW - Chemical vapor deposition

KW - Coating

KW - Mullite

KW - Silica

UR - https://www.scopus.com/pages/publications/4544243256

M3 - 文章

AN - SCOPUS:4544243256

SN - 1002-185X

VL - 33

SP - 609

EP - 611

JO - Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

JF - Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

IS - 6

ER -

CVD Al2O3-SiO2 compound and the mechanism investigation

摘要

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CVD Al₂O₃-SiO₂ compound and the mechanism investigation