Analysis and characterization of amorphous boron carbide coatings deposited from BCI₃-CH₄-H₂ mixtures

Amorphous boron carbide was prepared by chemical vapor deposition from BCI3-CH4-H2 system. The deposits were characterized by SEM, EDS, XRD, FTIR, Raman, and XPS. The results showed that deposition indicate cauliflower-like surface and glass-like cross-sectional morphologies. The boron concentration is 42.83at%, corresponding with 56.32at% carbon and 0.75af% oxygen by EDS. The XRD was not suitable to characterize amorphous boron carbide. B-C bond state was demonstrated by Raman, FTTR and XPS spectrum. Amorphous structure was demonstrated by TEM. The formation of intermediate reactant, B_xC_yH_zCl was very important for the deposition of amorphous boron carbide.