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Advancements in removal mechanism and precision manufacturing of (TiZrHfNbTa)C high-entropy ceramics with nanosecond laser

  • Northwestern Polytechnical University Xian

科研成果: 期刊稿件文章同行评审

摘要

(TiZrHfNbTa)C high-entropy ceramic is a category of ultra-refractory materials essential for applications in extreme environments, such as nuclear fusion reactors and aerospace thermal protection systems. Nanosecond lasers provide a new approach for achieving excellent surface integrity and dimensional accuracy. The influence of nanosecond lasers on the material removal mechanism and surface characteristics was systematically investigated through a combination of computational modeling and experimental validation. Equimolar HfC, TaC, ZrC, TiC, and NbC powders were employed as precursors to prepare (TiZrHfNbTa)C high-entropy carbide bulk ceramics by means of 1spark plasma sintering, and as shown here, the resultant ceramics were synthesized through this specific sintering technique. The samples were machined with a nanosecond laser at power levels of 4, 7, 10, and 13 W. The results show that nanosecond laser ablation induces a hierarchical oxidation sequence: Zr and Hf undergo preferential oxidation due to their lower ionization energies, followed by Ti, and finally Nb and Ta. A laser power of 10 W was found to provide a critical balance between manufacturing capability (kerf width = 161 μm and heat-affected region <5 μm) and surface quality. Thermal accumulation progressively intensifies with elevated laser power, culminating in reduced efficiency and compromised surface integrity. This study establishes a foundational framework for the precision manufacturing of refractory high-entropy ceramics, demonstrating that nanosecond lasers can achieve micron-scale precision while minimizing thermal damage. These findings provide valuable guidance for demanding applications in aerospace thermal protection, nuclear reactors, and concentrated solar energy systems.

源语言英语
页(从-至)4614-4625
页数12
期刊Journal of Materials Research and Technology
41
DOI
出版状态已出版 - 1 3月 2026

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